Abstract: The present invention discloses a pole cover assembly for covering a pole. The first sleeves or base sleeves, second sleeves or middle sleeves, and third sleeves or top sleeves or top cap. The pole cover assembly may also contain additional spacer sleeves. The pole cover assembly includes first sleeves, the second sleeves, and the third sleeves which come in front and rear semi-cylindrical tubes that snap together via inconspicuous tabs. Further, each of the first sleeves, the second sleeves, and the third sleeves include a series of disks that accommodate most type of poles i.e., square, round, and U-channel poles. The pole cover assembly acts as a cover for the poles and can snap around almost all types and sizes of poles. The pole cover assembly beautifies and brings visibility to any pole.

Abstract: Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.

Abstract: A method and system for controlling arcs in a DC sputtering system with a passive circuit is presented. The arc control system includes a sputtering chamber that houses an anode and a sputtering target formed from a target material and serving as a cathode. A DC power supply provides a DC voltage between the cathode and anode such that a cathode current flows from the anode to the cathode. A resonant network is coupled between the DC power supply and the chamber. The resonant network has sufficient Q so that in reaction to an arc, the cathode current resonates through zero, causing a positive voltage to be applied between the cathode and anode. A reverse voltage clamp is coupled across the resonant network to clamp the cathode voltage to a predetermined reverse voltage. The reverse cathode voltage inhibits subsequent arcing by positively charging insulated deposits on the sputtering target. The arc control system limits the quantity of energy that is dissipated by the arc.

Abstract: Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.