Abstract: An alignment fixture that may be used to align the components of a wafer etching machine. The fixture includes a base supporting at least one first alignment guide and a plurality of second alignment guides. The components to be aligned using the fixture may include inner and outer concentric rings. The outer ring may include one or more first position locator guides that are matched with the first alignment guide to establish a known positional relationship with the base. The inner ring may include one or more second position locator guides that are matched simultaneously with one or more first position locator guides and the second alignment guides to establish a known positional relationship between the outer ring and the inner ring. The outer and inner ring may be secured together in the established positional relationship using a conventional fastening means known in the art.