Abstract: The invention provides methods for forming silicon oxide-containing layer(s) on a substrate, such as glass, by heating a substrate, vaporizing at least one precursor comprising a monoalkylsilane having an alkyl group with greater than two carbon atoms to form a vaporized precursor stream, and contacting a surface of the heated substrate with the vaporized precursor stream at about atmospheric pressure to deposit one or more layers comprising silicon oxide onto the surface of the substrate. The invention is particularly useful for applying an anti-iridescent coating to glass in an online float glass process.

Abstract: A light-emitting devices and methods for forming light-emitting devices are provided. The device comprises of a substrate having a first refractive index, a transparent electrode that is coupled to an organic layer, where the transparent electrode has a second refractive index different from the first refractive index. An undercoat layer is selected that has a third refractive index to substantially match the first refractive index to the second refractive index. The undercoat layer is selected such that it has a capacity to reduce root mean square roughness of the transparent electrode film deposited. The undercoat layer is selected to improve electrical properties of the transparent electrode layer. The undercoat layer is provided between the substrate and the transparent electrode.

Abstract: A low-resistivity, doped zinc oxide coated glass article is formed by providing a hot glass substrate having a surface on which a coating is to be deposited, the surface being at a temperature of at least 400° C. A zinc containing compound, an oxygen-containing compound and an aluminum- or gallium-containing compound are directed to the surface on which the coating is to be deposited. The zinc containing compound, oxygen-containing compound, and aluminum- or gallium-containing compound are mixed together for a sufficient time that an aluminum or gallium doped zinc oxide coating is formed on the surface at a deposition rate of greater than 5 nm/second.

Abstract: What is described and claimed is an atmospheric chemical vapor deposition method of making a low-resistivity, doped zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, a fluorine containing compound, an oxygen containing compound, and at least one compound containing one or more of boron, aluminum, gallium and indium onto a surface of a heated glass substrate.

Abstract: An atmospheric chemical vapor deposition method of making a zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, and an oxygen containing compound, onto a surface of a transparent substrate material heated to a temperature of 400° C. or less.

Abstract: The invention described and claimed herein relates to a chemical vapor deposition process for depositing a zinc oxide coating on a substrate by delivering two gaseous precursor streams to a surface of the substrate, and mixing the gaseous precursor streams at the substrate surface for a time sufficiently short so as to form a zinc oxide coating at a deposition rate greater than 5 nm/second.

Abstract: A variety of new n-type TCO films including films with dopants having ionic sizes that approximate those of the metal oxide host material, films with stabilized rutile MO2, and films with AxMOy. The films are deposited by APCVD.

Abstract: An atmospheric chemical vapor deposition method of making a zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, and an oxygen containing compound, onto a surface of a transparent substrate material heated to a temperature of 400° C. or less.

Abstract: A low-resistivity, doped zinc oxide coated glass article is formed by providing a hot glass substrate having a surface on which a coating is to be deposited, the surface being at a temperature of at least 400° C. A zinc containing compound, an oxygen-containing compound and an aluminum- or gallium-containing compound are directed to the surface on which the coating is to be deposited. The zinc containing compound, oxygen-containing compound, and aluminum- or gallium-containing compound are mixed together for a sufficient time that an aluminum or gallium doped zinc oxide coating is formed on the surface at a deposition rate of greater than 5 nm/second.

Abstract: The invention described and claimed herein relates to a chemical vapor deposition process for depositing a zinc oxide coating on a substrate by delivering two gaseous precursor streams to a surface of the substrate, and mixing the gaseous precursor streams at the substrate surface for a time sufficiently short so as to form a zinc oxide coating at a deposition rate greater than 5 nm/second.

Abstract: What is described and claimed is an atmospheric chemical vapor deposition method of making a low-resistivity, doped zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, a fluorine containing compound, an oxygen containing compound, and at least one compound containing one or more of boron, aluminum, gallium and indium onto a surface of a heated glass substrate.