Patents by Inventor Jeffrey C. Ramer
Jeffrey C. Ramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10364509Abstract: In a rotating disk reactor for growing epitaxial layers on substrate or other CVD reactor system, gas directed toward the substrates at gas inlets at different radial distances from the axis of rotation of the disk has both substantially the same gas flow rate/velocity and substantially the same gas density at each inlet. The gas directed toward portions of the disk remote from the axis may include a higher concentration of a reactant gas than the gas directed toward portions of the disk close to the axis, so that portions of the substrate surfaces at different distances from the axis receive substantially the same amount of reactant gas per unit area, and a combination of carrier gases with different relative molecular weights at different radial distances from the axis of rotation are employed to substantially make equal the gas density in each region of the reactor.Type: GrantFiled: April 24, 2018Date of Patent: July 30, 2019Assignee: Veeco Instruments Inc.Inventors: Michael Murphy, Richard Hoffman, Jonathan Cruel, Lev Kadinski, Jeffrey C. Ramer, Eric A. Armour
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Publication number: 20180237943Abstract: In a rotating disk reactor for growing epitaxial layers on substrate or other CVD reactor system, gas directed toward the substrates at gas inlets at different radial distances from the axis of rotation of the disk has both substantially the same gas flow rate/velocity and substantially the same gas density at each inlet. The gas directed toward portions of the disk remote from the axis may include a higher concentration of a reactant gas than the gas directed toward portions of the disk close to the axis, so that portions of the substrate surfaces at different distances from the axis receive substantially the same amount of reactant gas per unit area, and a combination of carrier gases with different relative molecular weights at different radial distances from the axis of rotation are employed to substantially make equal the gas density in each region of the reactor.Type: ApplicationFiled: April 24, 2018Publication date: August 23, 2018Inventors: Michael Murphy, Richard Hoffman, Jonathan Cruel, Lev Kadinski, Jeffrey C. Ramer, Eric A. Armour
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Patent number: 9593434Abstract: In a rotating disk reactor (1) for growing epitaxial layers on substrate (3), gas directed toward the substrates at different radial distances from the axis of rotation of the disk has substantially the same velocity. The gas directed toward portions of the disk remote from the axis (10a) may include a higher concentration of a reactant gas (4) than the gas directed toward portions of the disk close to the axis (10d), so that portions of the substrate surfaces at different distances from the axis (14) receive substantially the same amount of reactant gas (4) per unit area. A desirable flow pattern is achieved within the reactor while permitting uniform deposition and growth of epitaxial layers on the substrate.Type: GrantFiled: April 17, 2014Date of Patent: March 14, 2017Assignee: Veeco Instruments Inc.Inventors: Michael Murphy, Richard Hoffman, Jonathan Cruel, Lev Kadinski, Jeffrey C. Ramer, Eric A. Armour
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Publication number: 20140224178Abstract: In a rotating disk reactor (1) for growing epitaxial layers on substrate (3), gas directed toward the substrates at different radial distances from the axis of rotation of the disk has substantially the same velocity. The gas directed toward portions of the disk remote from the axis (10a) may include a higher concentration of a reactant gas (4) than the gas directed toward portions of the disk close to the axis (10d), so that portions of the substrate surfaces at different distances from the axis (14) receive substantially the same amount of reactant gas (4) per unit area. A desirable flow pattern is achieved within the reactor while permitting uniform deposition and growth of epitaxial layers on the substrate.Type: ApplicationFiled: April 17, 2014Publication date: August 14, 2014Applicant: Veeco Instruments Inc.Inventors: Michael Murphy, Richard Hoffman, Jonathan Cruel, Lev Kadinski, Jeffrey C. Ramer, Eric A. Armour
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Patent number: 8668775Abstract: A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The inside cover can be attached to the bosses and can have apertures formed therein such that the apertures are generally contiguous with the bores. The housing, the bosses, and the inside cover cooperate to communicate water through the shower head. The water can cool the shower head to a temperature that is substantially lower than the temperature of other parts of the chemical vapor deposition chamber, e.g., the susceptor thereof.Type: GrantFiled: March 28, 2008Date of Patent: March 11, 2014Assignee: Toshiba Techno Center Inc.Inventors: Vahid S. Moshtagh, Jeffrey C. Ramer
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Patent number: 8232568Abstract: A light emitting device and method for making the same are disclosed. The device includes an active layer disposed between first and second layers. The first layer has top and bottom surfaces. The top surface includes a first material of a first conductivity type, including a plurality of pits in the substantially planar surface. The active layer overlies the top surface of the first layer and conforms to the top surface, the active layer generating light characterized by a wavelength when holes and electrons recombine therein. The second layer includes a second material of a second conductivity type, the second layer overlying the active layer and conforming to the active layer. The device can be constructed on a substrate having a lattice constant sufficiently different from that of the first material to give rise to dislocations in the first layer that are used to form the pits.Type: GrantFiled: August 21, 2009Date of Patent: July 31, 2012Assignee: Bridgelux, Inc.Inventors: Ling Zhang, Steven D. Lester, Jeffrey C. Ramer
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Patent number: 8216419Abstract: A shower head for a chemical vapor deposition chamber can comprise a plurality of first injectors for a first reactant gas and a plurality of second injectors for a second reactant gas. The first and second injectors can be interspersed among one another so as to enhance control of the mixing and delivery of reactant gases within the chemical deposition chamber. Cooling water can be communicated through a plurality of gun drilled bores formed intermediate injectors of the shower head. In this manner, enhanced control of the mixing and delivery of reactant gases can be provided.Type: GrantFiled: June 30, 2008Date of Patent: July 10, 2012Assignee: Bridgelux, Inc.Inventors: Vahid S. Moshtagh, Jeffrey C. Ramer
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Publication number: 20100133562Abstract: A light emitting device and method for making the same are disclosed. The device includes an active layer disposed between first and second layers. The first layer has top and bottom surfaces. The top surface includes a first material of a first conductivity type, including a plurality of pits in the substantially planar surface. The active layer overlies the top surface of the first layer and conforms to the top surface, the active layer generating light characterized by a wavelength when holes and electrons recombine therein. The second layer includes a second material of a second conductivity type, the second layer overlying the active layer and conforming to the active layer. The device can be constructed on a substrate having a lattice constant sufficiently different from that of the first material to give rise to dislocations in the first layer that are used to form the pits.Type: ApplicationFiled: August 21, 2009Publication date: June 3, 2010Inventors: Ling Zhang, Steven D. Lester, Jeffrey C. Ramer
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Publication number: 20090241833Abstract: A shower head for a chemical vapor deposition chamber can comprise a plurality of first injectors for a first reactant gas and a plurality of second injectors for a second reactant gas. The first and second injectors can be interspersed among one another so as to enhance control of the mixing and delivery of reactant gases within the chemical deposition chamber. Cooling water can be communicated through a plurality of gun drilled bores formed intermediate injectors of the shower head. In this manner, enhanced control of the mixing and delivery of reactant gases can be provided.Type: ApplicationFiled: June 30, 2008Publication date: October 1, 2009Inventors: Vahid S. Moshtagh, Jeffrey C. Ramer
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Publication number: 20090107403Abstract: A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The inside cover can be attached to the bosses and can have apertures formed therein such that the apertures are generally contiguous with the bores. The housing, the bosses, and the inside cover cooperate to communicate water through the shower head. The water can cool the shower head to a temperature that is substantially lower than the temperature of other parts of the chemical vapor deposition chamber, e.g., the susceptor thereof.Type: ApplicationFiled: March 28, 2008Publication date: April 30, 2009Inventors: Vahid S. Moshtagh, Jeffrey C. Ramer
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Patent number: 6349270Abstract: Apparatus and method for determining a real time, non-contact temperature measurement of semiconductor wafers is provided in a computer-based data gathering system. The apparatus includes a moving carrier containing semiconductor wafers and a pyrometer and a reflectometer positioned above the spinning wafer carrier for providing temperature and reflectivity data samples taken from the semiconductor wafers and spinning carrier. The data are then provided to an attached computer. The attached computer receives the reflectivity and temperature data pairs, stores them in a data table and records the frequency of occurrence of each of the reflectivity values in the series of reflectivity and temperature data.Type: GrantFiled: May 27, 1999Date of Patent: February 19, 2002Assignee: Emcore CorporationInventors: Alexander Gurary, Vadim Boguslavskiy, Ameesh N. Patel, Jeffrey C. Ramer