Patents by Inventor Jeffrey Giles

Jeffrey Giles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230180950
    Abstract: A pillow comprising a first component having a head-supporting material with an upper surface, a lower surface, and a raised wall formed between the upper and lower surfaces, wherein the wall includes a truncated first wall portion with a beveled upper edge and a beveled lower edge; a second wall portion adjacent to the first wall portion; a truncated third wall portion adjacent to the second wall portion and opposite the first wall portion with a beveled upper edge and a beveled lower edge; a fourth wall portion adjacent to the third wall portion and opposite the second wall portion having a cutout region configured to receive the shoulder of a user; and a removable second component having the shape of the first pillow component and being configured to enclose the first component, wherein the second component includes a tether configured to secure a length of tubing.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 15, 2023
    Inventors: Joshua Fenton, Jeffrey Giles
  • Publication number: 20100087065
    Abstract: Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a copper removal CMP composition, which is used to selectively remove and planarize copper, into a barrier removal CMP composition, which is used to selectively remove barrier layer material, on a single CMP platen pad.
    Type: Application
    Filed: January 31, 2008
    Publication date: April 8, 2010
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Karl E. Boggs, Jeffrey Giles, Michael S. Darsillo, Melissa A. Petruska, Peter Wrschka
  • Publication number: 20090215269
    Abstract: Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a Step I slurry formulation, which is used to selectively remove and planarize copper, into a Step II slurry formulation, which is used to selectively remove barrier layer material, on a single CMP platen pad.
    Type: Application
    Filed: June 6, 2006
    Publication date: August 27, 2009
    Applicant: Advanced Technology Materials Inc.
    Inventors: Karl E. Boggs, Michael S. Darsillo, Peter Wrschka, James Welch, Jeffrey Giles, Michele Stawasz
  • Patent number: 6641783
    Abstract: This invention relates to a high efficiency chromatographic system. More specifically, the present invention relates to a chromatographic system for determining the physicochemical properties of one or more compounds using at least two chromatographic units in eluent flow communication with one eluent analyzer via an intermediate eluent switch. The present chromatographic system allows determination of physicochemical properties through the use of multiple chromatographic units in communication with one eluent analyzer via an eluent switch.
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: November 4, 2003
    Inventors: Charles Pidgeon, Jianming Yin, Nadege Rooke, Sonyuan Lin, Jeffrey Giles