Patents by Inventor Jeffrey W. Labadie

Jeffrey W. Labadie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compositions for reductive aminations utilizing supported tricarboxyborohydride reagents and methods of using the same
    Patent number: 7985882
    Abstract: A modified solid-support for use as a supported reagent for use in reduction reactions, including reductive amination comprising a solid-support having an tetrasubstituted ammonium cation species ionically bonded to a borohydride anion species extending therefrom having the general formula: wherein P is a solid-support, S is a spacer group selected from the group consisting of alkylene, {including —(CH2)n—}, alkyleneoxy {including -0(CH2)n—}, alkylenethio {including —S(CH2)n—} and alkylenecarboxy, {including —O(O)C—(CH2)n—}, n=2-16. R1, R2, R3 and R are each independently selected from the group consisting of alkyl, cycloalkyl, haloalkyl and aryl. Y equals 1, 2 or 3. H is hydrogen or deuterium.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: July 26, 2011
    Assignee: Biotage AB
    Inventors: Sukanta Bhattacharyya, Jeffrey W. Labadie, Owen W. Gooding, Sunil Rana
  • Compositions for organic synthesis on solid phase and methods of using the same
    Patent number: 6147159
    Abstract: A modified solid support for use in solid phase synthesis which comprises:a solid support having a linker group extending therefrom having the general formula: ##STR1## wherein R.sub.1 and R.sub.2 are each independently selected from the group consisting of alkyl, cycloalkyl, aryl, alkoxy, aryloxy, fluorine, chlorine, iodine and bromine.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: November 14, 2000
    Assignee: Argonaut Technologies
    Inventors: Yonghan Hu, Jeffrey W. Labadie, John Anthony Porco, Jr., Barry Martin Trost
  • Process for making a multileveled electronic package
    Patent number: 5593720
    Abstract: A multilevel electronic package comprising at least two levels, each level including a poly(aryl ether benzimidazole), a polymide and copper. A process of preparing this package is disclosed. Several novel poly(aryl ether benzimidazoles) useful in preparing this package are also set forth.
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: January 14, 1997
    Assignee: IBM Corporation
    Inventors: Kie Y. Ahn, James L. Hedrick, Jr., Jeffrey W. Labadie, Kang-Wook Lee, Robert J. Twieg, Alfred Viehbeck, George F. Walker
  • Poly(aryl ether benzimidazoles)
    Patent number: 5516874
    Abstract: A multilevel electronic package comprising at least two levels, each level including a poly(aryl ether benzimidazole), a polymide and copper. A process of preparing this package is disclosed. Several novel poly(aryl ether benzimidazoles) useful in preparing this package are also set forth.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: May 14, 1996
    Assignee: IBM Corporation
    Inventors: Kie Y. Ahn, James L. Hedrick, Jr., Jeffrey W. Labadie, Kang-Wook Lee, Robert J. Twieg, Alfred Viehbeck, George F. Walker
  • Polyamic acid and polyimide from fluorinated reactant
    Patent number: 5464927
    Abstract: Copolyamic acid is obtained from tetracarboxylic acid dianhydride, diamine and a fluorinated diamine and/or fluorinated tetracarboxylic acid dianhydride; and optionally ester or amine salt derivative thereof to obtain radiation sensitive polymer; and low optical high thermally stable polyimide from curing the above polyamic acid and/or derivative thereof.
    Type: Grant
    Filed: May 10, 1993
    Date of Patent: November 7, 1995
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey D. Gelorme, Jeffrey W. Labadie, David A. Lewis, Sally A. Swanson, Nancy C. Labianca
  • Process for forming negative tone images of polyimides using base treatment of crosslinked polyamic ester
    Patent number: 5310625
    Abstract: The present invention relates to an improved process for forming negative tone images of photosensitive polyimides on a substrate having improved wall angles.
    Type: Grant
    Filed: August 3, 1993
    Date of Patent: May 10, 1994
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Daniel G. Berger, Jeffrey W. Labadie, Eric D. Perfecto, Martha I. Sanchez, Sally A. Swanson, Willi Volksen
  • Photosensitive polyamic alkyl ester composition and process for its use
    Patent number: 5206117
    Abstract: The present invention relates to photosensitive negative and positive tone compositions for imagewise deposition of polyimide on a substrate.
    Type: Grant
    Filed: March 13, 1992
    Date of Patent: April 27, 1993
    Inventors: Jeffrey W. Labadie, Dennis R. McKean, Willi Volksen, Gregory M. Wallraff
  • Hot roll fusers comprising polyarylene elastomers
    Patent number: 5051313
    Abstract: Hot roll fusers are made with a matrix resin which is an elastomer having a glass transition between 90.degree. C. and 160.degree. C. and a structure represented by the formula X--Ar--Y--Ar--X wherein Ar is an aromatic ring structure, Y is O, S, C.dbd.O, SO.sub.2, C(CH.sub.3).sub.2, C(CF.sub.3).sub.2, CH.sub.2 or (CF.sub.2).sub.n and X is --O--C.tbd.N, --C.tbd.
    Type: Grant
    Filed: July 31, 1990
    Date of Patent: September 24, 1991
    Assignee: Lexmark International, Inc.
    Inventors: James Economy, James L. Hedrick, Jr., Jeffrey W. Labadie
  • Polyimide-poly(phenylquinoxaline) block copolymers
    Patent number: 5045608
    Abstract: Block copolymers of polyimide and poly (phenylquinoxaline) have been synthesized. They are useful, particularly as dielectric layers in thin film multilayer structures. The most preferred embodiments are formed from polyimides which are those from pyromellitic dianhydride and oxydianiline. The most preferred poly (phenylquinoxaline) is a monofunctional oligomer, which yields the best microstructure.
    Type: Grant
    Filed: September 27, 1989
    Date of Patent: September 3, 1991
    Assignee: IBM Corporation
    Inventors: James L. Hedrick, Jr., Donald C. Hofer, Jeffrey W. Labadie, Sally A. Swanson, Willi Volksen
  • Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow
    Patent number: 4690838
    Abstract: The reactive ion etching and thermal flow resistance of a resist image is enhanced by contacting the resist image with an alkyl metal compound of magnesium or aluminum.
    Type: Grant
    Filed: August 25, 1986
    Date of Patent: September 1, 1987
    Assignee: International Business Machines Corporation
    Inventors: Hiroyuki Hiraoka, Jeffrey W. Labadie, James H. Lee, Scott A. MacDonald, Carlton G. Willson