Patents by Inventor Jeffrey Wetzel

Jeffrey Wetzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8414691
    Abstract: The system and method for recycling and using the heat from compressed gas produced by a biogas treatment plant. The system includes a biogas cleaning stage and a plurality of compression and heat exchanger stages that allows the heat generated by compressed gases to be harvested. After the heat is harvested, it is delivered to a jacketed vessel containing media used to remove contaminants from the biogas. The media inside the jacketed vessel requires regeneration or stripping of harmful VOCs and other contaminants picked up from the biogas. The system also includes an inert gas generator that creates hot inert gas that is delivered to the jacketed vessel that heats the media located therein to remove contaminants. Because the jacket vessel and the media are simultaneously heated, the system's heat-up time is reduced The system also includes a heat exchanger that partially recovers the heat from the inert gas.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: April 9, 2013
    Assignee: ESC Enviroenergy, LLC
    Inventors: Lowell Howard, Jeffrey Wetzel, Ronald Drake
  • Publication number: 20060144224
    Abstract: A process to purify biogases (i.e., landfill gas and municipal digester gas), to enable such biogases to be utilized to generate electricity and heat. Biogases from these sources generally include small amounts of organosilicons (which are particularly harmful to power generation equipment, and especially harmful to micro-turbines, reciprocating internal combustion engines, and large turbines), and halogenated chemical species (which can foul expensive emission catalysts). A fluidized media bed reactor is configured to concentrate offending organics, and is coupled with another reactor vessel configured to strip the offending organics off saturated media with a hot inert gas. The removed organics are further concentrated into an inert gas stream that is conveyed to a small flare for greater than 99% destruction. The energy required to strip the organics from the spent media, and to energize the flare, is generated by the combustion of a small quantity of the purified biogas.
    Type: Application
    Filed: September 21, 2005
    Publication date: July 6, 2006
    Applicant: Applied Filter Technology, Inc.
    Inventors: Lowell Howard, Paul Tower, Jeffrey Wetzel
  • Publication number: 20060000352
    Abstract: A plurality of different layers of filter media are used to remove siloxanes from a gas stream. Based on an analysis of the specific gas stream to be filtered, a filter media having an average pore size enabling the preferential removal of a specific class of contaminants is selected for each different class of contaminants. The layers are arranged in sequential order such that contaminants having a higher molecular weight are preferentially removed by the first layers. Collectively, the layers define a segmented activity gradient that enables each class of contaminants present in the gas stream to be preferentially removed in a different layer, preventing removal competition between different classes of contaminants. Preferable adsorption media exhibit a relatively narrow range of pore sizes. Both inorganic adsorption media and carbon-based adsorption media exhibiting a relatively narrow range of pore sizes can be used.
    Type: Application
    Filed: March 8, 2005
    Publication date: January 5, 2006
    Inventors: Paul Tower, Jeffrey Wetzel
  • Publication number: 20050230677
    Abstract: An interconnect structure in back end of line (BEOL) applications comprising a tunable etch resistant anti-reflective (TERA) coating is described. The TERA coating can, for example, be incorporated within a single damascene structure, or a dual damascene structure. The TERA coating can serve as part of a lithographic mask for forming the interconnect structure, or it may serve as a hard mask, a chemical mechanical polishing (CMP) stop layer, or a sacrificial layer during CMP.
    Type: Application
    Filed: June 13, 2005
    Publication date: October 20, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Jeffrey Wetzel, David Wang, Eric Lee, Dorel Toma
  • Publication number: 20050167839
    Abstract: A semiconductor device includes a semiconductor substrate, a film stack formed on the semiconductor substrate and having a film to be processed. A dual hard mask included in the film stack has an amorphous carbon layer and an underlying hard mask layer interposed between the amorphous carbon layer and the film to be processed, the hard mask layer does not include an amorphous carbon layer. A damascene structure for a metal interconnect is formed in the film stack. The amorphous carbon film can, for example, be incorporated within a single damascene structure, or a dual damascene structure. The amorphous carbon film can serve as part of a lithographic mask for forming the interconnect structure, or it may serve as a top layer of a dual hard mask, a chemical mechanical polishing (CMP) stop layer, or a sacrificial layer during CMP.
    Type: Application
    Filed: January 30, 2004
    Publication date: August 4, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Jeffrey Wetzel, David Wang, Eric Lee, Dorel Toma
  • Publication number: 20050104150
    Abstract: An interconnect structure in back end of line (BEOL) applications comprising a tunable etch resistant anti-reflective (TERA) coating is described. The TERA coating can, for example, be incorporated within a single damascene structure, or a dual damascene structure. The TERA coating can serve as part of a lithographic mask for forming the interconnect structure, or it may serve as a hard mask, a chemical mechanical polishing (CMP) stop layer, or a sacrificial layer during CMP.
    Type: Application
    Filed: November 14, 2003
    Publication date: May 19, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Jeffrey Wetzel, David Wang, Eric Lee, Dorel Toma