Patents by Inventor Jen-Yu Fang

Jen-Yu Fang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 10261427
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM
    Publication number: 20180136570
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: January 12, 2018
    Publication date: May 17, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR
  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 9869940
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: January 16, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Metrology Method and Apparatus, Computer Program and Lithographic System
    Publication number: 20160313654
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 27, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR
  • LIGHT CONTROL DEVICE HAVING MODIFIED PRISM STRUCTURE
    Publication number: 20080239728
    Abstract: The light control device provides fillings in the valleys of the prism elements, be it uniformly or non-uniformly arranged, which is made of UV and/or thermal curable resins of an appropriate refractive index different from that of the prism elements. The optical performance of the original prism elements can be altered by the following approaches. First, the refractive index of the fillings can be appropriately chosen. Second, the fillings can be up to an appropriate height (but never overruns the surrounding prism elements). Third, the distribution of the height or the refractive index of the fillings across the light emission plane can be “patterned,” that is, in accordance with the planar light intensity distribution produced by the light source.
    Type: Application
    Filed: March 27, 2007
    Publication date: October 2, 2008
    Inventors: Tien-Hon CHIANG, Gu-Sheng Yu, Han-Ping Shieh, Yi-Pai Huang, Jen-Yu Fang, Yu-Chun Lo