Patents by Inventor Jennifer L. Watia
Jennifer L. Watia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7993470Abstract: A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodge substantially all the particles from the textured surface. The method can be applied to dislodge grit particles from textured exposed surfaces formed by electromagnetic energy beam scanning and grit blasting. The method can also be applied to remove loosely adhered coating particles from the textured surfaces of coated components.Type: GrantFiled: December 16, 2008Date of Patent: August 9, 2011Assignee: Applied Materials, Inc.Inventors: Brian T West, Marc O Schweitzer, Jennifer L Watia
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Publication number: 20090120462Abstract: A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodge substantially all the particles from the textured surface. The method can be applied to dislodge grit particles from textured exposed surfaces formed by electromagnetic energy beam scanning and grit blasting. The method can also be applied to remove loosely adhered coating particles from the textured surfaces of coated components.Type: ApplicationFiled: December 16, 2008Publication date: May 14, 2009Inventors: Brian T. West, Marc O. Schweitzer, Jennifer L. Watia
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Patent number: 7097744Abstract: In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.Type: GrantFiled: June 12, 2003Date of Patent: August 29, 2006Assignee: Applied Materials, Inc.Inventors: Alan Barry Liu, Marc O. Schweitzer, James Stephen Van Gogh, Michael Rosenstein, Jennifer L. Watia, Xinyu Zhang, Yoichiro Tanaka, John C. Forster, Anthony Chen
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Patent number: 6933508Abstract: A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.Type: GrantFiled: March 13, 2002Date of Patent: August 23, 2005Assignee: Applied Materials, Inc.Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia
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Publication number: 20040251130Abstract: In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.Type: ApplicationFiled: June 12, 2003Publication date: December 16, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Alan Barry Liu, Marc O. Schweitzer, James Stephen Van Gogh, Michael Rosenstein, Jennifer L. Watia, Xinyu Zhang, Yoichiro Tanaka, John C. Forster, Anthony Chan
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Patent number: 6812471Abstract: A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.Type: GrantFiled: July 17, 2003Date of Patent: November 2, 2004Assignee: Applied Materials, Inc.Inventors: Alan R Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
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Publication number: 20040056211Abstract: A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.Type: ApplicationFiled: July 17, 2003Publication date: March 25, 2004Applicant: Applied Materials, Inc.Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
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Publication number: 20030173526Abstract: A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.Type: ApplicationFiled: March 13, 2002Publication date: September 18, 2003Applicant: Applied Materials, Inc.Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia