Abstract: Coating processes for vacuum chamber arrangements and apparatus thereof are herein disclosed. In some aspects, a coating process may include coating at least one workpiece using a vacuum chamber arrangement. The vacuum chamber arrangement may include a vacuum chamber, a substrate holding arrangement, an additional substrate holding arrangement, one or more bearings, a supply hose and an additional supply hose. The vacuum chamber may include a lock chamber, an additional lock chamber, a heating chamber, an additional heating chamber, and a coating chamber. The one or more bearings may support the substrate holding arrangement in such a way that it can be moved between the lock chamber and the coating chamber. The one or more bearings may also support the additional substrate holding arrangement in such a way that it can be moved between the additional lock chamber and the coating chamber.

Abstract: Coating processes for vacuum chamber arrangements and apparatus thereof are herein disclosed. In some aspects, a coating process may include coating at least one workpiece using a vacuum chamber arrangement. The vacuum chamber arrangement may include a vacuum chamber, a substrate holding arrangement, an additional substrate holding arrangement, one or more bearings, a supply hose and an additional supply hose. The vacuum chamber may include a lock chamber, an additional lock chamber, a heating chamber, an additional heating chamber, and a coating chamber. The one or more bearings may support the substrate holding arrangement in such a way that it can be moved between the lock chamber and the coating chamber. The one or more bearings may also support the additional substrate holding arrangement in such a way that it can be moved between the additional lock chamber and the coating chamber.

Abstract: In accordance with various embodiments, provision is made of a substrate holding device, wherein the latter may comprise a carrier plate with a recess, the recess extending from an upper side of the carrier plate to a lower side of the carrier plate through the carrier plate, a holding frame, which has a frame opening and a support area, surrounding the frame opening, for holding a substrate in the recess, wherein the holding frame inserted into the recess lies on the carrier plate in sections.

Abstract: According to various embodiments, a vacuum chamber arrangement can have the following: a vacuum chamber, which has a first supply passage; a substrate holding arrangement having a substrate holder for holding and positioning at least one substrate, a vacuumtight supply housing for supplying the substrate holder with at least one supply medium, wherein the supply housing has a second supply passage; a bearing arrangement, by means of which the substrate holding arrangement is supported movably within the vacuum chamber; and a supply hose, which links the first supply passage to the second supply passage.

Abstract: In accordance with various embodiments, provision is made of a substrate holding device, wherein the latter may comprise a carrier plate with a recess, the recess extending from an upper side of the carrier plate to a lower side of the carrier plate through the carrier plate, a holding frame, which has a frame opening and a support area, surrounding the frame opening, for holding a substrate in the recess, wherein the holding frame inserted into the recess lies on the carrier plate in sections.

Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.

Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.

Abstract: An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere.

Abstract: An elongate vacuum system for coating one or both sides of a flat substrate which can be displaced by the system, comprises at least one magnetron provided with a magnetron surrounding area and is subdivided into successive compartments in the direction of transportation of the substrate by separating walls having closeable suction openings. The compartments can be evacuated either directly by a vacuum connection provided on the compartment or indirectly via a suction opening in the separating wall. At least one compartment comprises an upper partial compartment which is arranged above the substrate. The partial compartment comprises a closeable upper opening in at least one of the outer walls thereof. The aim is to produce an elongate coating system which is flexible to use according to the requirements of various one and two-sided coating processes and ensures a stable, differential and process-optimized sputter atmosphere.

Abstract: A vacuum coating system for coating elongate substrates includes one or several coating sections and one or several pump sections, at lease one magnetron in an arrangement as a sputter-down-variant above the substrate which has a target surface opposite the upper side of the substrate and/or in an arrangement as a sputter-up-variant below the substrate which has a target surface opposite the lower side of the substrate, and a transport device. The aim is to form an inline coating system for the two lateral coatings of elongate substrates, wherein construction costs and space required are reduced. The aim is achieved by use of a transport device arranged in a divided manner on a drive plane and on a transport plane. In sputter-up-variants, the underside of a magnetron body containing the magnetron lies above the drive plane.

Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.