Patents by Inventor Jeong Gey Lee

Jeong Gey Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating an electrode of a plasma chamber
    Patent number: 6399499
    Abstract: Disclosed is a method for fabricating an electrode of a plasma chamber. According to the method, a circular silicon substrate is provided facing a drilling plate having a plurality of tips projected from one surface of the drilling plate. Afterwards, a polishing material containing a plurality of polishing particles is supplied on the circular silicon substrate and the drilling plate. Thereafter, an ultrasonic wave is applied to the drilling plate to vibrate the tips of the drilling plate. The plurality of polishing particles collide with the circular silicon plate during the vibration of the tips of the drilling plate and a plurality of fine through holes are thereby formed in the circular silicon plate.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: June 4, 2002
    Inventor: Jeong Gey Lee