Abstract: Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.

Abstract: A manufacturing process using a replica mold for nano imprinting having a grid type pattern by combining a nano imprint with a dry etching process is disclosed. In order to attain such a manufacturing process, a method of fabricating a mold for nano imprinting may include arranging a master mold having first patterns over a substrate having metal patterns so that both the first pattern and the metal pattern cross over each other, applying resin between the master mold and the substrate, applying an imprinting treatment of the substrate as well as the master mold, hardening the resin, and etching the hardened resin after the master mold is released, so as to form a replica mold for nano imprint. The nano imprinting process and the etching process may easily form a pattern in a more complicated structure, and therefore, may improve production yield and reduce processing time thereof.

Abstract: Disclosed herein are a method of manufacturing various replica molds for nano imprint using nano imprint and etching and a method of forming a multi-step pattern or a micro pattern through a nano imprint process using the manufactured replica molds for nano imprint. A pattern forming method using nano imprint may include applying a mold resin between a substrate having a first pattern patterned thereon and a master mold with a second pattern patterned thereon, aligning the substrate and the master mold to imprint a pattern, curing the mold resin, separating the master mold from the substrate, and etching the cured mold resin to manufacture a replica mold for nano imprint. The method may also include forming an imprint resin on a forming substrate, pressing the replica mold into the imprint resin, curing the imprint resin, separating the replica mold from the imprint resin, and washing the first imprint resin.

Abstract: Example embodiments relate to a method of forming a three-dimensional micro pattern or a multi-step pattern using a nano imprinting process and a method of manufacturing a mold to form such a pattern. A molding polymer may be patterned in a one-step shape on a substrate having UV barrier patterns, thereby easing the manufacture of a mold for multi-step imprinting and simplifying the formation of a multi-step pattern using the one-step shaped mold by avoiding the repetition of more complicated processes. Consequently, it may be possible to form a relatively large-area micro pattern, a relatively large-area pattern usable in flat panel displays, and a nano pattern having a size of several tens of nanometers in a semiconductor process, thereby contributing to the reduction of process costs, the reduction of process time, and the improvement of production yield.

Abstract: Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.