Abstract: A metrology apparatus for measuring a parameter of interest of a target on a substrate, the metrology apparatus including: m×n detectors, wherein m?1 and n?1; a first frame; and (n?1) second frames; and (m?1)×n intermediate frames, wherein each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.

Abstract: A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

Abstract: Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potential metrology locations. Each of said candidate acquisition configurations is evaluated in terms of an evaluation metric and a candidate acquisition configuration is selected based on said evaluation. The corresponding metrology locations for the selected acquisition configuration is added to the sampling scheme.

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate having: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; a sensor configured to generate inspection information relating to a parameter of the component of the apparatus, the sensor embedded in the body; a control detector embedded in the body and configured to detect a control signal transmitted by the apparatus for processing production substrates; and a controller embedded in the body and configured to control the sensor in response to detection of the control signal.

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate having: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; a sensor configured to generate inspection information relating to a parameter of the component of the apparatus, the sensor embedded in the body; a control detector embedded in the body and configured to detect a control signal transmitted by the apparatus for processing production substrates; and a controller embedded in the body and configured to control the sensor in response to detection of the control signal.

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

Abstract: A lithographic apparatus includes a positioner configured to position a first part of the apparatus relative to a second part of the apparatus, the positioner including a motor having a motor position dependent motor constant defining a relation between a motor input and a motor output, and a control system to drive the motor, the control system including a set-point generator to provide a reference signal based on a desired position of the first part relative to the second part, and a controller to provide a drive signal to the motor based on the reference signal, wherein the controller includes a compensator which is configured to at least partially compensate the drive signal for the motor position dependent motor constant. The invention further relates to a positioner, a method to optimize the positioning system, and a method to derive a motor position dependent motor constant.

Abstract: A method and a device for fast disc recognition for use in read/write performances when an optical disc is connected to an optical drive, including the provision of a set S of parameters for safe data transfer between the drive and the disc, the direct calibration during a disc recognition step only of those parameters out of said set S in need of a direct calibration, the start of a read/write data transfer sequence after said disc recognition step is finalized and the calibration of the remaining parameters at first after or during one or more data transfer read/write sequences.

Abstract: A device is for scribing a visible label on the medium includes a head for providing a beam and generating a detector signal in dependence of radiation reflected from the medium, and a focus unit or generating a focus control signal for focusing the beam. A label control unit controls the scribing in dependence of label data. The focus unit detects a focus error by including a focus excitation signal in the focus control signal and detecting a deviation in the detector signal in dependence of the focus excitation signal. The label control unit is for controlling the focus unit in dependence on the label data to detect the focus error during said scribing and without interrupting said scribing.

Abstract: The present invention relates to a method for operating an optical drive system (12) capable of reproducing/recording information from/to an optical carrier (1), wherein the optical drive system includes a focus controller (PID) for controlling a focus actuator (4), and a focus memory loop (ML) for applying a stored correction signal to the focus actuator (4). The method aims at avoiding impacts between the focussing means (3) and the optical carrier (1), by gradually stopping the focus control loop in response to an event, such as a user initiated ejection of the optical carrier. The gradual stop of the focus control loop is achieved by gradually reducing a memory loop parameter of the focus memory loop (ML), and by gradually reducing a controller parameter of an integrating part (I) of the focus controller (PID). It is an advantage of the invention that the phase of the stored correction signal is synchronized with the angular position of optical carrier (1) during the gradual stopping.

Abstract: In a method and device for performing tilt control, a focus and a tilt controlling output is generated, and a focusing and tilt state of an optical recording/reproducing beam is controlled by determining a radial tilt value based on a differentiation of focus control values obtained at different radii of said optical disk (1). The combination of, e.g., a 3D actuator with the dz/dr tilt measurement provides the advantage that focus and tilt adjustment can be performed in the same element. Thereby, influences or measurement variations caused by environmental conditions and/or circuit characteristics can be minimized to reduce compensations requirements. Furthermore, a 3D actuator (11) with a split coil arrangement may be used to provide a three-dimensional focus adjustment. Thereby, the 3D actuator (11) can be used for feed-forward tilt compensation without offset or gain errors and without any additional sensor.