Patents by Inventor Jeroen Huijbregstse

Jeroen Huijbregstse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
    Patent number: 7565219
    Abstract: A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: July 21, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Jeroen Huijbregstse, Sicco Ian Schets, Bart Luc Swinnen
  • Method for position determination, method for overlay optimization, and lithographic projection apparatus
    Patent number: 7288779
    Abstract: A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: October 30, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Sicco Ian Schets, Jeroen Huijbregstse, Allan Reuben Dunbar, Nicolaas Petrus Van Der Aa
  • Method for position determination, method for overlay optimization, and lithographic projection apparatus
    Publication number: 20050133743
    Abstract: A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
    Type: Application
    Filed: December 17, 2003
    Publication date: June 23, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sicco Schets, Jeroen Huijbregstse, Allan Dunbar, Nicolaas Van Der Aa