Abstract: A method for cleaning a component comprises a first stage including the steps of: (i) loading a component into the cleaning chamber of a flush station, (ii) directing a deionized water stream through first filter means, (iii) introducing carbon dioxide into the filtered water stream, (iv) directing the carbonated water stream into a fluid passage to be cleaned in the component, and (v) collecting the dirty water stream after it passes through the component and directing the collected dirty water stream through second filter means for reuse. The method can further include a second stage including the steps of: (vi) loading the component into a testing chamber of a testing station, (vii) directing a deionized water stream through third filter means, (viii) directing the filtered water stream into the fluid passage in the component, and (ix) collecting the water stream after it passes through the component and directing the collected water stream into a particle counter.

Abstract: A method for cleaning a component comprises a first stage including the steps of: (i) loading a component into the cleaning chamber of a flush station, (ii) directing a deionized water stream through first filter means, (iii) introducing carbon dioxide into the filtered water stream, (iv) directing the carbonated water stream into a fluid passage to be cleaned in the component, and (v) collecting the dirty water stream after it passes through the component and directing the collected dirty water stream through second filter means for reuse. The method can further include a second stage including the steps of: (vi) loading the component into a testing chamber of a testing station, (vii) directing a deionized water stream through third filter means, (viii) directing the filtered water stream into the fluid passage in the component, and (ix) collecting the water stream after it passes through the component and directing the collected water stream into a particle counter.