Abstract: Provided is a method for attaching a terminal cooperating with a secure element to the network of a MNO of a visited country. The method includes steps of switching a set of files of said secure element to a new value, including a new SUPI, called entity support SUPI; Building at the level of said secure element an entity support SUCI; Routing an attachment request to said support entity with said entity support SUCI; Decrypting in said support entity said entity support SUCI back in said entity support SUPI; and Swapping said support entity SUPI to the SUPI corresponding to the MNO of the home country. If an authentication is performed that is positive, an attachment acknowledgement message is sent to connect said terminal to said network of said MNO of said visited country.

Abstract: A computer-implemented method for testing cybersecurity of a target environment. The method includes: receiving data from the target environment, the data including software elements; accessing a database of vulnerabilities, and extracting therefrom a list of vulnerabilities including all of the vulnerabilities associated with an element; and building a list of vulnerability chains on the basis of the list of vulnerabilities. The building includes: for each given vulnerability in the list of vulnerabilities, comparing consequences of the current vulnerability with the means of the given vulnerability; when a similarity is found, defining one or more new chains by adding the given vulnerability to each of the chains in the current list, adding the new chain(s) to the list of vulnerability chains, and repealing the receiving and the accessing with the given vulnerability as the current vulnerability, and the list of vulnerability chains as the current list.

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: The invention relates to a sensor-type or actuator-type MEMS or NEMS device provided with a stacked stop element comprising —a first flat layer having a first flat electrode intended to be at a first electric potential and a second flat electrode intended to be at a second electric potential different from the first potential, said first flat electrode being movable relative to the second flat electrode in a first direction parallel to the first flat layer, —a second flat layer placed on top of the first flat layer and electrically insulated from the first flat layer by at least one intermediate layer made of an insulating material, the second flat layer comprising a first flat element that is mechanically secured to the first flat electrode, and a second flat element that is mechanically secured to the second flat electrode, characterized in that it further comprises at least one stop element extending from the first flat element or the second flat element in the first direction and projecting from said flat

Abstract: The invention relates to a damping system for a mobile mass (2) of a MEMS device (1), the system being capable of preventing direct contact between the mass (2) and a surface element (3) of the MEMS device (1), the damping system comprising: a mechanical bumper (4) positioned between the mass (2) and the surface element (3); a system (5) for locking/unlocking the bumper (4), which comprises one branch (51) oriented towards the bumper (4) having a blocking end (53) and a pin joint (54) capable of pivoting the branch (51), the locking/unlocking system (5) defining two subsequent positions of the mass (2).

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: The invention relates to a damping system for a mobile mass (2) of a MEMS device (1), the system being capable of preventing direct contact between the mass (2) and a surface element (3) of the MEMS device (1), the damping system comprising: a mechanical bumper (4) positioned between the mass (2) and the surface element (3); a system (5) for locking/unlocking the bumper (4), which comprises one branch (51) oriented towards the bumper (4) having a blocking end (53) and a pin joint (54) capable of pivoting the branch (51), the locking/unlocking system (5) defining two subsequent positions of the mass (2).

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: The invention relates to a sensor-type or actuator-type MEMS or NEMS device provided with a stacked stop element comprising —a first flat layer having a first flat electrode intended to be at a first electric potential and a second flat electrode intended to be at a second electric potential different from the first potential, said first flat electrode being movable relative to the second flat electrode in a first direction parallel to the first flat layer, —a second flat layer placed on top of the first flat layer and electrically insulated from the first flat layer by at least one intermediate layer made of an insulating material, the second flat layer comprising a first flat element that is mechanically secured to the first flat electrode, and a second flat element that is mechanically secured to the second flat electrode, characterized in that it further comprises at least one stop element extending from the first flat element or the second flat element in the first direction and projecting from said flat

Abstract: Example systems, methods and computer program products for cloud-based, anatomy-specific identification, processing and routing of image data in a cloud infrastructure are disclosed. An example method includes evaluating, automatically by a particularly programmed processor in a cloud infrastructure, image data to identify an anatomy in the image data. The example method includes processing, automatically by the processor, the image data based on a processing algorithm determined by the processor based on the anatomy identified in the image data. The example method also includes routing, automatically by the processor, the image data to a data consumer based on a routing strategy determined by the processor based on the anatomy identified in the image data. The example method includes generating, automatically by the processor based on the processing and routing, at least one of a push of the image data and a notification of availability of the image data.

Abstract: Example systems, methods and computer program products for cloud-based, anatomy-specific identification, processing and routing of image data in a cloud infrastructure are disclosed. An example method includes evaluating, automatically by a particularly programmed processor in a cloud infrastructure, image data to identify an anatomy in the image data. The example method includes processing, automatically by the processor, the image data based on a processing algorithm determined by the processor based on the anatomy identified in the image data. The example method also includes routing, automatically by the processor, the image data to a data consumer based on a routing strategy determined by the processor based on the anatomy identified in the image data. The example method includes generating, automatically by the processor based on the processing and routing, at least one of a push of the image data and a notification of availability of the image data.

Abstract: This description describes a system for identifying individuals within a digital file. The system accesses a digital file describing the movement of unidentified individuals and detects a face for an unidentified individual at a plurality of locations in the video. The system divides the digital file into a set of segments and detects a face of an unidentified individual by applying a detection algorithm to each segment. For each detected face, the system applies a recognition algorithm to extract feature vectors representative of the identity of the detected faces which are stored in computer memory. The system applies a recognition algorithm to query the extracted feature vectors for target individuals by matching unidentified individuals to target individuals, determining a confidence level describing the likelihood that the match is correct, and generating a report to be presented to a user of the system.

Abstract: Example systems, methods and computer program products for cloud-based, anatomy-specific identification, processing and routing of image data in a cloud infrastructure are disclosed. An example method includes evaluating, automatically by a particularly programmed processor in a cloud infrastructure, image data to identify an anatomy in the image data. The example method includes processing, automatically by the processor, the image data based on a processing algorithm determined by the processor based on the anatomy identified in the image data. The example method also includes routing, automatically by the processor, the image data to a data consumer based on a routing strategy determined by the processor based on the anatomy identified in the image data. The example method includes generating, automatically by the processor based on the processing and routing, at least one of a push of the image data and a notification of availability of the image data.

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract: A non-weft, unidirectional fabric is provided that includes a plurality of substantially parallel reinforcement fiber bundles. The reinforcement fiber bundles have a first surface and an opposing second surface. The non-weft, unidirectional fabric further includes at least one of a non-woven veil bonded to at least one surface and one or more bands of sprayed adhesive spanning across at least a portion of the width of one of the first and second surfaces of the plurality of substantially parallel reinforcement fibers.