Abstract: In a photolithographic process utilizing a wafer coated with a chemically amplified photoresist, a method for controlling a line dimension. The method comprises the steps of measuring at at least two times, and from at least two angles, evolving signals comprising intensities of light diffracted from a portion of an exposed patterned area on the waver, the evolving signals corresponding to vector combinations of time dependent light diffracted from the pattern appearing in the photoresist; and substantially time invariant light diffracted due to any underlying pattern beneath the photoresist; and, combining the measurements mathematically for extracting a contribution due to the pattern evolving in the photoresist.

Abstract: The process involves a well stimulation treatment of a hydrocarbon reservoir containing solid pyrobitumen. A strong oxidant, preferably sodium hypochlorite, is injected into the reservoir as an aqueous solution containing 5 wt. % or higher concentration of the oxidant. The oxidant is retained in contact with the formation for a predetermined retention period and the well is then backflowed or pumped to remove oxidation products. The permeability of the reservoir is improved, apparently by conversion of the solid pyrobitumen to removable gaseous and liquid products.

Abstract: Measurement apparatus and procedure for use with lithographic equipment is provided for the construction of electronic and other devices wherein a photoresist is deposited as a layer upon a substrate. A Nomarski differential interference contrast microscope in conjunction with a scanned image detector is employed to examine verification marks produced by projection of an overlay, such as the mask or reticle, upon the photoresist layer. The projection results in a production of verification marks in the form of a latent image which, while invisible with conventional viewing means, can be viewed by phase-contrast imaging employing differential phase shift. Various characteristics of the resultant image are employed to align secondary verification marks with primary verification marks previously provided on the substrate, and to allow for a checking of line width, dosage, focusing, temperature control, and global alignment.

Abstract: A display system has a driver program for displaying alphanumeric characters and a driver program for displaying graphics. When a graphics window is opened, a program in the operating system establishes a control block containing a code that has been made unique within the user's program. For operations within a window, a function packet is passed to the appropriate driver. The operations are identified by the unique code and several independent windows can be created.