Abstract: A cleaning device for cleaning pin contact elements and support hardware in a semiconductor testing apparatus that has a cleaning layer with a predetermined configuration appropriate for the particular pin contact elements and a substrate having a configuration to be introduced into the testing apparatus during the normal testing operating of the testing apparatus. The cleaning layer secured to the substrate has predetermined characteristics that cause the pad to clean debris the pin contact elements and support hardware when the pin contact elements and support hardware contact the pad during the normal operation of the testing machine.

Abstract: A method for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed. In the method, a cleaning device is loaded into wafer prober or packaged device handler and the pin contact elements and support hardware are contacted by the cleaning device.

Abstract: A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed. The cleaning material may include a cleaning pad layer and one or more intermediate layers that have predetermined characteristics.

Abstract: A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated.

Abstract: A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated.

Abstract: A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated.

Abstract: A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing equipment. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, or projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as in an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can be adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may made by a novel method of making, and it may then be used in a novel method of use in combination with chip manufacturing apparatus.

Abstract: A test cell conditioner (TCC) surrogate cleaning device for cleaning the pin elements in a socket or electrical interface receptacle of a load board includes a main testing frame, a plurality of trays, testing chip receptacles and one or more pick up devices. Chips to be tested (electronic elements) are entrained on a tray, and a plurality of adhesive cleaning chips are entrained on another tray. The adhesive cleaning chip contains a solid layer and an adhesive layer, and an abrasive material is mingled in the adhesive layer. The pick up device removes the adhesive cleaning chip to a position above the testing chip receptacle and cleans up the oxides and other foreign materials sticking on the receptacle by absorption or abrasion. Interrupting the operation of the apparatus to clean the test probe by etching can be excluded so as to improve the working efficiency.

Abstract: An apparatus (30) and method (80) for predicting electrical property stability of a thin film or conductive substrate (14) prior to multi-probe testing. The present invention utilizes a nanoindenter type device (10) obtaining mechanical properties as a function of displacement depth and applied load into the bond pad surface to accurately predict electrical property stability of the entire substrate or sample under test. In addition, the present invention includes a nanoindenter type device (10) including a second probe (34) having the ability to measure localized electrical properties of the sample while obtaining the mechanical property measurements. This additional electrical measurement is correlated with the mechanical property measurements to accurately predict electrical property stability of the entire conductive substrate, preferably by predicting the presence of an unwanted material surface layer.

Abstract: An apparatus (30) and method (80) for predicting electrical property stability of a thin film or conductive substrate (14) prior to multi-probe testing. The present invention utilizes a nanoindenter type device (10) obtaining mechanical properties as a function of displacement depth and applied load into the bond pad surface to accurately predict electrical property stability of the entire substrate or sample under test. In addition, the present invention includes a nanoindenter type device (10) including a second probe (34) having the ability to measure localized electrical properties of the sample while obtaining the mechanical property measurements. This additional electrical measurement is correlated with the mechanical property measurements to accurately predict electrical property stability of the entire conductive substrate, preferably by predicting the presence of an unwanted material surface layer.