Patents by Inventor Jerry Yeh

Jerry Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160077626
    Abstract: Layer structure for a touch panel, and a touch panel using the same are provided. In an embodiment, the layer structure includes a substrate; a transparent conductive layer, and an opaque area. The transparent conductive layer, disposed on the substrate, includes at least one electrode. The opaque area, disposed on a peripheral area of the transparent conductive layer, includes a conductive film layer. In addition, the opaque area can further include a dielectric film layer.
    Type: Application
    Filed: September 12, 2014
    Publication date: March 17, 2016
    Inventors: JERRY YEH, PING JUNG KAO
  • Patent number: 7360922
    Abstract: A light tube assembly includes a light tube and a stabilizer which includes a tubular body with copper members that are slidably engaged with curved slots in a base. A core with terminal plates is received in the tubular body and two locking pin 51s extend through grooves in the tubular body and are removably inserted into the base. An end cap is rotatably connected to the core and is positioned at three positions. The three positions allow the user to replace the base, to replace the light tube and to secure the light tube respectively.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: April 22, 2008
    Assignee: Weico (Asia) Industries Ltd.
    Inventor: Jerry Yeh
  • Patent number: 6302057
    Abstract: An apparatus for depositing a film on a substrate utilizing a plasma-enhanced chemical vapor deposition process comprises a process chamber having an electrically grounded element therein and an RF biased electrode positioned in the process chamber proximate a substrate. An insulative element is coupled between the electrode and the grounded element other than the grounded substrates, and is formed of an electrically insulative material and has an insulative surface for effectively electrically isolating the electrode from the grounded element within the process chamber. The insulative element includes at least one feature formed in the insulative surface, wherein the feature has a high effective aspect ratio for inhibiting the deposition of a film therein to thereby create an electrical discontinuity in a film which may form on the insulative surface during the plasma-enhanced chemical vapor deposition process.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: October 16, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Gerrit J. Leusink, Michael G. Ward, Tayler Bao, Jerry Yeh, Joseph T. Hillman, Tugrul Yasar