Patents by Inventor Jesse BISCHOF
Jesse BISCHOF has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11959894Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.Type: GrantFiled: February 22, 2019Date of Patent: April 16, 2024Assignee: Silcotek CorpInventors: Jesse Bischof, Lucas D. Patterson, Gary Barone, Min Yuan, David A. Smith
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Publication number: 20240117495Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.Type: ApplicationFiled: October 13, 2020Publication date: April 11, 2024Inventors: Geoffrey K. WHITE, Nicholas P. DESKEVICH, James B. MATTZELA, Gary A. BARONE, David A. SMITH, Pierre A. LECLAIR, Min YUAN, Jesse BISCHOF
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Publication number: 20230074641Abstract: Pharmaceutical manufacturing processes and products are disclosed. A pharmaceutical manufacturing process includes flowing a liquid through a pathway. The liquid contacts a non-polymeric coating on a substrate within the pathway. The substrate is a metal or metallic substrate. A pharmaceutical product is produced by flowing a liquid through a pathway. The liquid contacts a non-polymeric coating on a substrate within the pathway. The substrate is a metal or metallic substrate.Type: ApplicationFiled: January 22, 2021Publication date: March 9, 2023Inventors: Jesse BISCHOF, Martin E. HIGGINS, Thomas WINTER
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Publication number: 20220073754Abstract: Medical device products have a coating with NAMSA Class VI certification and properties corresponding to the prior art coatings within U.S. Pat. No. 10,604,660. Medical device processes use the medical device product having a coating with NAMSA Class VI certification and properties corresponding to the prior art coatings within U.S. Pat. No. 10,604,660.Type: ApplicationFiled: August 20, 2021Publication date: March 10, 2022Inventors: Patrick DICK, David A. SMITH, Jesse BISCHOF, Ricky EDMISTON
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Patent number: 11261524Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.Type: GrantFiled: April 9, 2019Date of Patent: March 1, 2022Assignee: SilcoTek Corp.Inventors: Thomas F. Vezza, James B. Mattzela, Gary A. Barone, Jesse Bischof, David A. Smith
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Publication number: 20210384601Abstract: Dielectric coatings, articles having dielectric coatings, and systems including coating having dielectric coatings are disclosed. The dielectric article includes a substrate having hidden surfaces and a dielectric coating on the hidden surfaces of the substrate. The dielectric coating has a bulk resistivity of at least 108 ?·cm and a thickness of between 30 nanometers and 3,000 nanometers.Type: ApplicationFiled: May 24, 2021Publication date: December 9, 2021Inventors: Min YUAN, Jesse BISCHOF
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Publication number: 20210170305Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C.Type: ApplicationFiled: February 17, 2021Publication date: June 10, 2021Inventors: Jesse BISCHOF, Lucas D. PATTERSON, Gary BARONE, Min YUAN, David A. SMITH
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Publication number: 20210101092Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.Type: ApplicationFiled: February 22, 2019Publication date: April 8, 2021Inventors: Jesse BISCHOF, Lucas D. PATTERSON, Gary BARONE, Min YUAN, David A. SMITH
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Patent number: 10881986Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.Type: GrantFiled: February 22, 2019Date of Patent: January 5, 2021Assignee: SILCOTEK CORP.Inventors: Jesse Bischof, Lucas D. Patterson, Gary Barone, Min Yuan, David A. Smith
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Publication number: 20190309414Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.Type: ApplicationFiled: April 9, 2019Publication date: October 10, 2019Inventors: Thomas F. VEZZA, James B. MATTZELA, Gary A. BARONE, Jesse BISCHOF, David A. SMITH
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Publication number: 20190262745Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.Type: ApplicationFiled: February 22, 2019Publication date: August 29, 2019Inventors: Jesse BISCHOF, Lucas D. PATTERSON, Gary BARONE, Min YUAN, David A. SMITH
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Publication number: 20190136371Abstract: Article having a molybdenum substrate and an amorphous chemical vapor deposition coating on the molybdenum substrate, processes of using the articles, and processes of producing the articles are disclosed. The articles include a molybdenum substrate and an amorphous chemical vapor deposition coating on the molybdenum substrate. The amorphous chemical vapor deposition coating includes silicon. The processes of using the article include exposing the article to temperatures of greater than 1,200° C. The processes of producing the article include positioning the molybdenum substrate, and applying the amorphous chemical vapor deposition coating on the molybdenum substrate through thermal chemical vapor deposition.Type: ApplicationFiled: November 6, 2018Publication date: May 9, 2019Inventor: Jesse BISCHOF