Patents by Inventor Jesus Orsely Carrero

Jesus Orsely Carrero has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for calibrating a lithography model
    Patent number: 8279409
    Abstract: The present invention provides a method for calibrating a computational model of a lithography process by calculating a demerit function using an intensity measurement at a location of a wafer; and calibrating the lithography model or a mask making model by determining values of parameters of the computational model using the calculated demerit function. The method may also use a second demerit function that is defined by the sum of squares of differences between a simulated and measured critical dimensions of a feature on the wafer.
    Type: Grant
    Filed: August 5, 2009
    Date of Patent: October 2, 2012
    Assignee: Cadence Design Systems, Inc.
    Inventors: Abdurrahman Sezginer, Hsu-Ting Huang, Jesus Orsely Carrero, Tatung Chow, Kostyantyn Chuyeshov, Gokhan Percin