Patents by Inventor Jhy-Long Jeng

Jhy-Long Jeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9169357
    Abstract: A polyimide copolymer represented by formula (I) or formula (II) is provided. In formula (I) or formula (II), B is a cycloaliphatic group or aromatic group, A is an aromatic group, R is hydrogen or phenyl, and m and n are 20-50. The invention also provides a method for fabricating a patterned metal oxide layer.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: October 27, 2015
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jhy-Long Jeng, Jeng-Yu Tsai, Shur-Fen Liu, Chin-Ching Lin, Yu-Chun Chen, Wen-Ching Sun, Jinn-Shing King
  • Patent number: 8420745
    Abstract: A thermally curable solder resist composition for a flexible printed circuit board is provided. The solder resist composition includes (a) 50-100 parts by weight of an epoxy resin, wherein the epoxy resin includes at least an aliphatic polyester modified epoxy resin having formula (I) or (II), in which, each of R1 and R2, independently, is a C6-38 saturated or an unsaturated carbon chain, R3 is ether, phenyl, a C6-38 heterocyclic or C6-38 saturated carbon chain, n is an integer of 1-10 and the aliphatic polyester modified epoxy resin had a molecular weight of 1000-5000; (b) 1-10 parts by weight of a curing agent; and (c) 1-10 parts by weight of a catalyst.
    Type: Grant
    Filed: August 24, 2011
    Date of Patent: April 16, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Jhy-Long Jeng, Jeng-Yu Tsai, Shur-Fen Liu, Jinn-Shing King
  • Publication number: 20130029049
    Abstract: A polyimide copolymer represented by formula (I) or formula (II) is provided. In formula (I) or formula (II), B is a cycloaliphatic group or aromatic group, A is an aromatic group, R is hydrogen or phenyl, and m and n are 20-50. The invention also provides a method for fabricating a patterned metal oxide layer.
    Type: Application
    Filed: December 23, 2011
    Publication date: January 31, 2013
    Inventors: Jhy-Long JENG, Jeng-Yu TSAI, Shur-Fen LIU, Chin-Ching LIN, Yu-Chun CHEN, Wen-Ching SUN, Jinn-Shing KING
  • Publication number: 20110306703
    Abstract: A thermally curable solder resist composition for a flexible printed circuit board is provided. The solder resist composition includes (a) 50-100 parts by weight of an epoxy resin, wherein the epoxy resin includes at least an aliphatic polyester modified epoxy resin having formula (I) or (II), in which, each of R1 and R2, independently, is a C6-38 saturated or an unsaturated carbon chain, R3 is ether, phenyl, a C6-38 heterocyclic or C6-38 saturated carbon chain, n is an integer of 1-10 and the aliphatic polyester modified epoxy resin had a molecular weight of 1000-5000; (b) 1-10 parts by weight of a curing agent; and (c) 1-10 parts by weight of a catalyst.
    Type: Application
    Filed: August 24, 2011
    Publication date: December 15, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jhy-Long JENG, Jeng-Yu TSAI, Shur-Fen LIU, Jinn-Shing KING
  • Publication number: 20100167205
    Abstract: A thermally curable solder resist composition for a flexible printed circuit board is provided. The solder resist composition includes (a) 50-100 parts by weight of an epoxy resin, wherein the epoxy resin includes at least an aliphatic polyester modified epoxy resin having formula (I) or (II), in which, each of R1 and R2, independently, is a C6-38 saturated or an unsaturated carbon chain, R3 is ether, phenyl, a C6-38 heterocyclic or C6-38 saturated carbon chain, n is an integer of 1-10 and the aliphatic polyester modified epoxy resin had a molecular weight of 1000-5000; (b) 1-10 parts by weight of a curing agent; and (c) 1-10 parts by weight of a catalyst.
    Type: Application
    Filed: May 7, 2009
    Publication date: July 1, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jhy-Long JENG, Jeng-Yu TSAI, Shur-Fen LIU, Jinn-Shing KING
  • Patent number: 6670090
    Abstract: The present invention relates to a positive-working photosensitive composition comprising a partially diazonaphthoquinone (DNQ) capped polyamic ester with a capping level of about 5-80 molar %; a photosensitive agent and a solvent. The composition shows a high photosensitivity and leaves a relief pattern with high resolution and low dark film loss.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: December 30, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Steve Lien-Chung Hsu, Jinn-Shing King, Po-I Lee, Jhy-Long Jeng