Patents by Inventor Ji-beom Yoo
Ji-beom Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230408905Abstract: A method of manufacturing a pellicle for an extreme ultraviolet exposure includes forming a graphite-containing layer on a catalyst substrate; surface-treating a first surface of the graphite-containing layer to form a first treatment layer; and forming a first passivation layer on the first treatment layer, wherein the forming of the first treatment layer includes removing a C—O—C bond included in the graphite-containing layer through the surface-treating of the first surface.Type: ApplicationFiled: April 12, 2023Publication date: December 21, 2023Applicants: Samsung Electronics Co., Ltd., RESEARCH & BUSINESS FOUNDATIONSUNGKYUNKWAN UNIVERSITYInventors: Mun Ja KIM, Ki Bong NAM, Jin Ho YEO, Byungchul YOO, Ji Beom YOO, Changyoung JEONG
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Publication number: 20230273515Abstract: A method of fabricating a pellicle structure includes forming a metal layer on a temporary substrate, forming a membrane on the metal layer, exposing a bottom surface of the metal layer by separating the temporary substrate from the metal layer, and exposing a bottom surface of the membrane by etching the exposed bottom surface of the metal layer.Type: ApplicationFiled: September 20, 2022Publication date: August 31, 2023Applicants: SAMSUNG ELECTRONICS CO., LTD., Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: MUN JA KIM, JI BEOM YOO, KI BONG NAM, JIN HO YEO, CHANGYOUNG JEONG, QICHENG HU
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Publication number: 20220350240Abstract: A method for manufacturing a pellicle according to the technical idea of the present invention includes preparing a support substrate, forming a catalyst layer including nickel (Ni) in which one selected from a (110) plane and a (100) plane is a dominant crystal plane, on the support substrate, and performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer.Type: ApplicationFiled: April 3, 2022Publication date: November 3, 2022Applicants: Samsung Electronics Co., Ltd., RESEARCH AND BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITYInventors: Mun Ja Kim, Ji-Beom Yoo, Qicheng Hu, Changyoung Jeong, Ki-Bong Nam, Jin-Ho Yeo
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Patent number: 11067887Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.Type: GrantFiled: July 1, 2020Date of Patent: July 20, 2021Assignees: SAMSUNG ELECTRONICS CO., LTD., Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Mun-Ja Kim, Ji-Beom Yoo, Soo-Young Kim, Hee-Bom Kim, Hwan-Chul Jeon, Seul-Gi Kim, Tae-Sung Kim, Dong-Wook Shin
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Publication number: 20200333701Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.Type: ApplicationFiled: July 1, 2020Publication date: October 22, 2020Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Mun-Ja KIM, Ji-Beom YOO, Soo-Young KIM, Hee-Bom KIM, Hwan-Chul JEON, Seul-Gi KIM, Tae-Sung KIM, Dong-Wook SHIN
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Patent number: 10747104Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.Type: GrantFiled: August 30, 2017Date of Patent: August 18, 2020Assignees: SAMSUNG ELECTRONICS CO., LTD., Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Mun-Ja Kim, Ji-Beom Yoo, Soo-Young Kim, Hee-Bom Kim, Hwan-Chul Jeon, Seul-Gi Kim, Tae-Sung Kim, Dong-Wook Shin
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Patent number: 10394117Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: GrantFiled: May 11, 2018Date of Patent: August 27, 2019Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
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Patent number: 10345698Abstract: A method for fabricating a semiconductor device includes forming a pellicle including an amorphous carbon layer, attaching the pellicle onto a reticle, and forming a photoresist pattern by utilizing EUV light transmitted through the pellicle and reflected by the reticle. The forming the pellicle includes forming a first dielectric layer on a first side of the substrate, forming the amorphous carbon layer on the first dielectric layer, forming a second dielectric layer on a second side of the substrate opposite to the first side of the substrate, etching the second dielectric layer overlapping the first region of the substrate to form a mask pattern, and forming a support including the second region of the substrate and the remaining part of the first dielectric layer. The forming the support includes etching the first region of the substrate and the first dielectric layer on the first region.Type: GrantFiled: May 26, 2017Date of Patent: July 9, 2019Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungyunkwan UniversityInventors: Ji Beom Yoo, Sung Won Kwon, Dong Wook Shin, Mun Ja Kim, Jin Su Kim, Hwan Chul Jeon
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Publication number: 20180275508Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.Type: ApplicationFiled: August 30, 2017Publication date: September 27, 2018Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Mun-Ja KIM, Ji-Beom YOO, Soo-Young KIM, Hee-Bom KIM, Hwan-Chul JEON, Seul-Gi KIM, Tae-Sung KIM, Dong-Wook SHIN
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Publication number: 20180259847Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: ApplicationFiled: May 11, 2018Publication date: September 13, 2018Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY, Fine Semitech Co., Ltd.Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
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Patent number: 10065402Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.Type: GrantFiled: February 3, 2016Date of Patent: September 4, 2018Assignees: SAMSUNG ELECTRONICS CO., LTD., RESEARCH & BUSINESS FOUNDATION SUNGKYUNK WAN UNIVERSITYInventors: Mun Ja Kim, Byung-Gook Kim, Hwan Chul Jeon, Ji-Beom Yoo, Dong-Wook Shin, Taesung Kim, Sooyoung Kim
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Patent number: 10001700Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: GrantFiled: June 3, 2014Date of Patent: June 19, 2018Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
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Publication number: 20180136554Abstract: A method for fabricating a semiconductor device includes forming a pellicle including an amorphous carbon layer, attaching the pellicle onto a reticle, and forming a photoresist pattern by utilizing EUV light transmitted through the pellicle and reflected by the reticle. The forming the pellicle includes forming a first dielectric layer on a first side of the substrate, forming the amorphous carbon layer on the first dielectric layer, forming a second dielectric layer on a second side of the substrate opposite to the first side of the substrate, etching the second dielectric layer overlapping the first region of the substrate to form a mask pattern, and forming a support including the second region of the substrate and the remaining part of the first dielectric layer. The forming the support includes etching the first region of the substrate and the first dielectric layer on the first region.Type: ApplicationFiled: May 26, 2017Publication date: May 17, 2018Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan UniversityInventors: Ji Beom YOO, Sung Won KWON, Dong Wook SHIN, Mun Ja KIM, Jin Su KIM, Hwan Chul JEON
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Patent number: 9753367Abstract: The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.Type: GrantFiled: December 17, 2015Date of Patent: September 5, 2017Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan UniversityInventors: Munja Kim, Ji-Beom Yoo, Sooyoung Kim, Taesung Kim, Dong-Wook Shin, Hwanchul Jeon, Seul-Gi Kim
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Patent number: 9690190Abstract: A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.Type: GrantFiled: December 15, 2015Date of Patent: June 27, 2017Assignees: SAMSUNG ELECTRONICS CO., LTD., SUNGKYUNKWAN UNIVERSITY'S RESEARCH & BUSINESS FOUNDATIONInventors: Mun-Ja Kim, Tae-Sung Kim, Ji-Beom Yoo, Byung-Gook Kim, Soo-Young Kim, Dong-Wook Shin, Jae-Hyuck Choi
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Publication number: 20160355001Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.Type: ApplicationFiled: February 3, 2016Publication date: December 8, 2016Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: MUN JA KIM, Byung-Gook KIM, HWAN CHUL JEON, Ji-Beom YOO, Dong-Wook SHIN, Taesung KIM, Sooyoung KIM
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Publication number: 20160282712Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.Type: ApplicationFiled: June 3, 2014Publication date: September 29, 2016Applicants: Research & Business Foundation SUNGKYUNKWAN UNIVER SITY, Fine Semitech Co., Ltd.Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
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Publication number: 20160201201Abstract: A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.Type: ApplicationFiled: December 15, 2015Publication date: July 14, 2016Applicant: SungKyunKwan University's Research & Business FoundationInventors: Mun-Ja KIM, Tae-Sung KIM, Ji-Beom YOO, Byung-Gook KIM, Soo-Young KIM, Dong-Wook SHIN, Jae-Hyuck CHOI
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Publication number: 20160195804Abstract: The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.Type: ApplicationFiled: December 17, 2015Publication date: July 7, 2016Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Munja KIM, Ji-Beom YOO, Sooyoung KIM, Taesung KIM, Dong-Wook SHIN, Hwanchul JEON, Seul-Gi KIM
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Patent number: 9371234Abstract: The present invention relates to a method for forming graphene at a low temperature, to a method for direct transfer of graphene using same, and to a graphene sheet. The method for forming graphene at a low temperature comprises supplying a carbon-source-containing gas to a metal catalyst layer for graphene growth formed on a substrate, and forming graphene at a low temperature of 500° C. or less by means of inductively coupled plasma-chemical vapor deposition (ICP-CVD).Type: GrantFiled: July 15, 2011Date of Patent: June 21, 2016Assignees: Graphene Square, Inc., Hanwha Techwin Co., Ltd.Inventors: Byung Hee Hong, Jong-Hyun Ahn, Ji Beom Yoo, Su Kang Bae, Myung Hee Jung, Houk Jang, Youngbin Lee, Sang Jin Kim