Patents by Inventor Ji Hun Rhee

Ji Hun Rhee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11962001
    Abstract: Disclosed is a positive electrode material for a lithium secondary battery. The positive electrode material includes a positive electrode active material formed of Li—[Mn—Ti]-M-O-based material including a transition metal (M) to enable reversible intercalation and deintercalation of lithium and molybdenum oxide. The positive electrode active material is coated with the molybdenum oxide to form a coating layer on a surface thereof.
    Type: Grant
    Filed: October 6, 2021
    Date of Patent: April 16, 2024
    Assignees: Hyundai Motor Company, Kia Corporation, Industry Academy Cooperation Foundation of Sejong University
    Inventors: Seung Min Oh, Jun Ki Rhee, Yoon Sung Lee, Ji Eun Lee, Sung Ho Ban, Ko Eun Kim, Woo Young Jin, Sang Mok Park, Sang Hun Lee, Seung Taek Myung, Hee Jae Kim, Min Young Shin
  • Patent number: 6908977
    Abstract: Disclosed herein is a siloxane-based resin prepared by hydrolyzing and polycondensing a cyclic siloxane compound, a silane compound having three hydrolysable functional groups and a silane compound having three hydrolysable functional groups and one heat-labile functional group, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein is a method of forming an insulating film between interconnect layers of a semiconductor device using the siloxane-based resin thus prepared, whereby an insulating film having low dielectric constant as well as excellent mechanical properties can be obtained.
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: June 21, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Gyu Lee, Yi Yeol Lyu, Ji Hun Rhee
  • Publication number: 20040096398
    Abstract: Disclosed herein is a siloxane-based resin prepared by hydrolyzing and polycondensing a cyclic siloxane compound, a silane compound having three hydrolysable functional groups and a silane compound having three hydrolysable functional groups and one heat-labile functional group, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein is a method of forming an insulating film between interconnect layers of a semiconductor device using the siloxane-based resin thus prepared, whereby an insulating film having low dielectric constant as well as excellent mechanical properties can be obtained.
    Type: Application
    Filed: October 16, 2003
    Publication date: May 20, 2004
    Inventors: Jin Gyu Lee, Yi Yeol Lyu, Ji Hun Rhee