Abstract: The present disclosure relates to a novel bacteriophage having ability to specifically kill Clostridium perfringens and an antibacterial composition comprising the same. The novel bacteriophage CJ_CP_20-25 has the effect of specifically killing Clostridium perfringens, exhibits excellent acid resistance and heat resistance, and can thus be widely used in antibiotics, feed additives, drinking water additives, feed, drinking water, disinfectants, or cleaning agents for the prevention or treatment of infectious diseases caused by Clostridium perfringens.

Abstract: Provided is a method for manufacturing a composition for increasing cognitive function.

Abstract: The present application relates to a novel bacteriophage having enterotoxigenic Escherichia coli-specific bactericidal effect and an antibacterial composition comprising same, the novel bacteriophage CJ_Eco_20-4 having enterotoxigenic Escherichia coli-specific bactericidal effect, and being superbly acid and heat resistant to allow wide use in antibiotics, feed and additives therefor, beverages and additives therefor, disinfectants, detergents, and the like to prevent or treat infectious diseases caused by enterotoxigenic Escherichia coli.

Abstract: The present application relates to a novel bacteriophage having Clostridium perfringens-specific bactericidal effect and an antibacterial composition comprising same, the novel bacteriophage CJ_CP_20-11-1 having Clostridium perfringens-specific bactericidal effect, and being superbly acid and heat resistant to allow wide use in antibiotics, feed and additives therefor, beverages and additives therefor, disinfectants, detergents, and the like to prevent or treat infectious diseases caused by Clostridium perfringens.

Abstract: A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.

Abstract: A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.