Patents by Inventor Ji-yeon KU

Ji-yeon KU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9748095
    Abstract: A method of controlling a growth crystallographic plane of a metal oxide semiconductor having a wurtzite crystal structure by using a thermal chemical vapor deposition method includes controlling a growth crystallographic plane by allowing the metal oxide semiconductor to grow in a non-polar direction by using a source material including a thermal decomposition material that reduces a surface energy of a polar plane of the metal oxide semiconductor.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: August 29, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-jun Park, Jung-inn Sohn, Seung-nam Cha, Ji-yeon Ku
  • Patent number: 9386131
    Abstract: A method of performing a function by combining one or more blocks including sensing whether the one or more blocks are connected, determining indexes respectively corresponding to the connected one or more blocks, deciding, by using the indexes, a function to be performed based on the sensing, the function being one of a plurality of functions, each function associated with a respective set of function blocks, and generating a control signal for performing the decided function may be provided.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: July 5, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-yeon Ku, Sang-hyun Lee, Sung-woo Hwang
  • Publication number: 20160172193
    Abstract: A method of controlling a growth crystallographic plane of a metal oxide semiconductor having a wurtzite crystal structure by using a thermal chemical vapor deposition method includes controlling a growth crystallographic plane by allowing the metal oxide semiconductor to grow in a non-polar direction by using a source material including a thermal decomposition material that reduces a surface energy of a polar plane of the metal oxide semiconductor.
    Type: Application
    Filed: February 24, 2016
    Publication date: June 16, 2016
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-jun PARK, Jung-inn SOHN, Seung-nam CHA, Ji-yeon KU
  • Patent number: 9305778
    Abstract: A method of controlling a growth crystallographic plane of a metal oxide semiconductor having a wurtzite crystal structure by using a thermal chemical vapor deposition method includes controlling a growth crystallographic plane by allowing the metal oxide semiconductor to grow in a non-polar direction by using a source material including a thermal decomposition material that reduces a surface energy of a polar plane of the metal oxide semiconductor.
    Type: Grant
    Filed: April 9, 2013
    Date of Patent: April 5, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-jun Park, Jung-inn Sohn, Seung-nam Cha, Ji-yeon Ku
  • Publication number: 20150065196
    Abstract: A method of performing a function by combining one or more blocks including sensing whether the one or more blocks are connected, determining indexes respectively corresponding to the connected one or more blocks, deciding, by using the indexes, a function to be performed based on the sensing, the function being one of a plurality of functions, each function associated with a respective set of function blocks, and generating a control signal for performing the decided function may be provided.
    Type: Application
    Filed: January 6, 2014
    Publication date: March 5, 2015
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-yeon KU, Sang-hyun LEE, Sung-woo HWANG
  • Publication number: 20140138672
    Abstract: A method of controlling a growth crystallographic plane of a metal oxide semiconductor having a wurtzite crystal structure by using a thermal chemical vapor deposition method includes controlling a growth crystallographic plane by allowing the metal oxide semiconductor to grow in a non-polar direction by using a source material including a thermal decomposition material that reduces a surface energy of a polar plane of the metal oxide semiconductor.
    Type: Application
    Filed: April 9, 2013
    Publication date: May 22, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-jun PARK, Jung-inn SOHN, Seung-nam CHA, Ji-yeon KU
  • Publication number: 20130146834
    Abstract: A quantum dot-matrix thin film and a method of preparing a quantum dot-matrix thin film are provided. The thin film includes quantum dots; an inorganic matrix in which the quantum dots are imbedded; and an interface layer disposed between the quantum dots and the inorganic matrix to surround surfaces of the quantum dots. The method includes preparing a quantum dot solution in which quantum dots with inorganic ligands are dispersed; adding a matrix precursor to the quantum dot solution; coating the quantum dot solution comprising the matrix precursor on a substrate; and annealing the substrate coated with the quantum dot solution.
    Type: Application
    Filed: August 24, 2012
    Publication date: June 13, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyung-sang CHO, Ji-yeon KU, Byoung-lyong CHOI
  • Publication number: 20130146838
    Abstract: A quantum dot device includes: a cathode layer; an anode layer; an active layer that is disposed between the cathode layer and the anode layer and includes a quantum layer; and an electron movement control layer that is disposed between the cathode layer and the anode layer and includes a different kind of quantum layer having an energy level different from that of the quantum layer comprised in the active layer.
    Type: Application
    Filed: September 13, 2012
    Publication date: June 13, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-yeon KU, Tae-ho KIM, Dae-young CHUNG, Kyung-sang CHO, Byoung-lyong CHOI