Patents by Inventor Ji-Yun KWON

Ji-Yun KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140186768
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Application
    Filed: August 8, 2013
    Publication date: July 3, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Hwan SONG, Eun-Kyoung YOUN, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Publication number: 20140170562
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Application
    Filed: July 17, 2012
    Publication date: June 19, 2014
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 8735029
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Eun-Kyung Yoon, Eun-Ha Hwang, Jong-Hwa Lee, Ji-Yun Kwon, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Jun-Ho Lee, Jin-Young Lee, Hyun-Yong Cho, Chung-Beom Hong
  • Patent number: 8617796
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an organic salt-type sulfonate-containing dye; (B) a pigment; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: December 31, 2013
    Assignee: Cheil Industries Inc.
    Inventors: In-Jae Lee, Ji-Yun Kwon, Ju-Ho Jung, Dong-Won Song, Han-Chul Hwang, Jae-Hyun Kim, Gyu-Seok Han
  • Publication number: 20130306918
    Abstract: Provided are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a colorant including a diaminopyridine azo-based dye including a structure represented by Chemical Formula 1, and having an absorption wavelength at about 450 to about 550 nm, (B) an acrylic-based binder resin, (C) an acrylic-based photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.
    Type: Application
    Filed: June 27, 2013
    Publication date: November 21, 2013
    Inventors: Ji-Yun KWON, In-Jae LEE, Ju-Ho JUNG, Dong-Wan KIM, Jae-Hyun KIM, Gyu-Seok HAN
  • Publication number: 20130171564
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eun-Kyung YOON, Eun-Ha HWANG, Jong-Hwa LEE, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Jun-Ho LEE, Jin-Young LEE, Hyun-Yong CHO, Chung-Beom HONG
  • Publication number: 20130171568
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Eun-Kyung YOON, Jong-Hwa LEE, Jun-Ho LEE, Jin-Young LEE, Hwan-Sung CHEON, Hyun-Yong CHO, Chung-Beom HONG, Eun-Ha HWANG
  • Publication number: 20130164682
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: September 5, 2012
    Publication date: June 27, 2013
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Yong CHO, Sang-Soo KIM, Eun-Kyung YOON, Jong-Hwa LEE, Jun-Ho LEE, Eun-Ha HWANG, Ji-Yun KWON, Jin-Young LEE
  • Publication number: 20130122422
    Abstract: Disclosed are photosensitive resin composition that includes a dye including a methine-based compound represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and a metal complex, and a color filter using the same.
    Type: Application
    Filed: August 20, 2012
    Publication date: May 16, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, Nam-Gwang KIM, Shahrokh MOTALLEBI, In-Jae LEE, Sun-Hee JIN, Jae-Hyun KIM, Hwan-Sung CHEON, Gyu-Seok HAN
  • Publication number: 20120161087
    Abstract: A photosensitive resin composition for a color filter including a colorant including a dye represented by the following Chemical Formula 1, (B) an acrylic-based binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a color filter using the same are provided. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: August 3, 2011
    Publication date: June 28, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ju-Ho Jung, Ji-Yun Kwon, In-Jae Lee, Dong-Wan Kim, Jae-Hyun Kim, Dong-Won Song, Gyu-Seok Han, Han-Chul Hwang
  • Publication number: 20120138858
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an organic salt-type sulfonate-containing dye; (B) a pigment; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent.
    Type: Application
    Filed: July 7, 2011
    Publication date: June 7, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: In-Jae LEE, Ji-Yun KWON, Ju-Ho JUNG, Dong-Won SONG, Han-Chul HWANG, Jae-Hyun KIM, Gyu-Seok HAN
  • Publication number: 20110250531
    Abstract: The present invention provides a photosensitive resin composition for a color filter including a methine-based dye represented by the following Chemical Formula 1, and a color filter fabricated using the same. In Chemical Formula 1, R1 and R2 are respectively the same as defined in the specification.
    Type: Application
    Filed: December 20, 2010
    Publication date: October 13, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, In-Jae LEE, Ju-Ho JUNG, Myung-Hwan CHANG, Dong-Won SONG, Han-Chul HWANG, Sung-Hoon PARK