Patents by Inventor Jia Han LIN

Jia Han LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11971624
    Abstract: A display device includes a first display unit emitting a green light having a first output spectrum corresponding to a highest gray level of the display device and a second display unit emitting a blue light having a second output spectrum corresponding to the highest gray level of the display device. The first output spectrum has a main wave with a first peak. The second output spectrum has a main wave with a second peak and a sub wave with a sub peak. The second peak corresponds to a main wavelength, the sub peak corresponds to a sub wavelength, and the main wavelength is less than the sub wavelength. An intensity of the second peak is greater than an intensity of the sub peak and an intensity of the first peak.
    Type: Grant
    Filed: July 6, 2023
    Date of Patent: April 30, 2024
    Assignee: InnoLux Corporation
    Inventors: Hsiao-Lang Lin, Jia-Yuan Chen, Jui-Jen Yueh, Kuan-Feng Lee, Tsung-Han Tsai
  • Patent number: 10936785
    Abstract: A method (of manufacturing a semiconductor device) includes, for a layout diagram stored on a non-transitory computer-readable medium, generating the layout diagram including: populating a row which extends in a first direction with a group of cells, each cell representing a circuit, and first and second side boundaries of each cell being substantially parallel and extending in a second direction which is substantially perpendicular to the first direction; locating, relative to the first direction, cells so that neighboring ones of the cells are substantially abutting; and reducing an aggregate leakage tendency of the group by performing at least one of the following, (A) changing an orientation of at least one of the cells, or (B) changing locations correspondingly of at least two of the cells.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: March 2, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Hiranmay Biswas, Chung-Hsing Wang, Kuo-Nan Yang, Jia Han Lin
  • Publication number: 20200074042
    Abstract: A method (of manufacturing a semiconductor device) includes, for a layout diagram stored on a non-transitory computer-readable medium, generating the layout diagram including: populating a row which extends in a first direction with a group of cells, each cell representing a circuit, and first and second side boundaries of each cell being substantially parallel and extending in a second direction which is substantially perpendicular to the first direction; locating, relative to the first direction, cells so that neighboring ones of the cells are substantially abutting; and reducing an aggregate leakage tendency of the group by performing at least one of the following, (A) changing an orientation of at least one of the cells, or (B) changing locations correspondingly of at least two of the cells.
    Type: Application
    Filed: August 21, 2019
    Publication date: March 5, 2020
    Inventors: Hiranmay BISWAS, Chung-Hsing WANG, Kuo-Nan YANG, Jia Han LIN