Abstract: A display control method applicable to an all-in-one (AIO) computer is provided. The AIO computer includes a first monitor and a second monitor. The display control method includes: receiving a control instruction from the first monitor; projecting a display content on the second monitor according to the control instruction; and selectively enabling a touch control function of the second monitor according to the control instruction.

Abstract: A tumor radiation probe of iodine-123 marker thymidine (FLT) analogue [123I]-IaraU is disclosed. Commercial available uridine is used as the raw material for the synthesis of the precursor. A radioactive iodine-123 is marked on an alkaline group of uridine to obtain [123I]-IaraU, which is distinguishable from [18F]-FLT marking 18F on a glycosyl group to obtain a novel tumor radiation probe. The marking procedures include mixing the marker precursor with Na [123I] solution, acetic acid and hydrogen peroxide solution, and the solution of chloroform and sodium hydroxide. The sonication time increases from 1 minute to 10 minutes, so that [123I]-IaraU has radiologically chemical purity of higher than 98% and radiological specific activity of not less than 0.196 GBq/umole, and the yield can increase from 8% to 40%. Its radioactive specific activity, yield and purity reach to the degree for the use in biological experiments, while reducing production cost.

Abstract: A tumor radiation probe of iodine-123 marker thymidine (FLT) analogue [123I]-IaraU is disclosed. Commercial available uridine is used as the raw material for the synthesis of the precursor. A radioactive iodine-123 is marked on an alkaline group of uridine to obtain [123I]-IaraU, which is distinguishable from [18F]-FLT marking 18F on a glycosyl group to obtain a novel tumor radiation probe. The marking procedures include mixing the marker precursor with Na [123I] solution, acetic acid and hydrogen peroxide solution, and the solution of chloroform and sodium hydroxide. The sonication time increases from 1 minute to 10 minutes, so that [123I]-IaraU has radiologically chemical purity of higher than 98% and radiological specific activity of not less than 0.196 GBq/umole, and the yield can increase from 8% to 40%. Its radioactive specific activity, yield and purity reach to the degree for the use in biological experiments, while reducing production cost.

Abstract: In the fabrication of semiconductor integrated circuits, a ventilation system is disclosed which includes a sleeve device, a ventilator and a sensor. The sleeve device has at least one aperture thereon for gas transfer. The ventilator is coupled to the sleeve device. The sensor is coupled to the sleeve device. A method of ventilation is also disclosed, which includes a step of sensing a relative movement between a sleeve having at least aperture for gas transfer and a gas outlet connected to a pipeline, and a step of generating a signal to control a ventilator when the relative movement between the sleeve and the gas outlet is sensed.

Abstract: In the fabrication of semiconductor integrated circuits, a ventilation system is disclosed which includes a sleeve device, a ventilator and a sensor. The sleeve device has at least one aperture thereon for gas transfer. The ventilator is coupled to the sleeve device. The sensor is coupled to the sleeve device. A method of ventilation is also disclosed, which includes a step of sensing a relative movement between a sleeve having at least aperture for gas transfer and a gas outlet connected to a pipeline, and a step of generating a signal to control a ventilator when the relative movement between the sleeve and the gas outlet is sensed.

Abstract: An apparatus for servicing a wafer chuck such as an electrostatic chuck that is equipped with vent holes for cooling the backside of a wafer positioned on the chuck and for clearing the vent holes is provided. The novel apparatus can be used either in replacing a gas supply conduit to the electrostatic chuck without having to break vacuum in the process chamber, or can be used in clearing the vent holes when servicing an electrostatic chuck. The apparatus consists of a three-way control valve and a high pressure gas supply line of a suitable inert gas.

Abstract: A method for preventing corrosion in a load-lock chamber used in a cluster-type wafer processing system by utilizing an additional degas chamber and by the execution of an additional degas operation is provided. In the method, a degas chamber which is equipped with a purge gas inlet and a purge gas outlet directed at a wafer surface positioned in the degas chamber is used. The wafer is degassed by a purge gas of N.sub.2, O.sub.2 or any other suitable gas prior to being transferred back to a load-lock chamber. A suitable purge gas flow rate between about 100 sccm and about 5,000 sccm is used to effectively purge away undesirable, residual process gas from the surface of a wafer. In an alternate embodiment, the purge gas of N.sub.2 or O.sub.2 may be preheated to at least 30.degree. C. to improve the efficiency of purging. In another alternate embodiment, the wafer itself may be heated in the degas chamber to a temperature of between about 100.degree. C. and about 250.degree. C.

Abstract: A viewfinder device for viewing the interior of dark, inaccessible areas and environments, such as the chamber of a vertical cassette elevator or load lock used in semiconductor wafer fabricating systems, consisting of three housing sections forming a displaced optical path from the interior of the chamber on which the device is mounted through a viewport on the chamber to a viewfinder and viewing lens at the observing end of the device. The first housing section is mounted on a suitable rotater assembly on the top wall of the chamber to the viewport by an adapter member, and is fitted in its side with an illuminating means, for illuminating the interior of the chamber. An image reflected from the chamber interior passes up through the optical column formed by the first section and is reflected by a reflector mirror, disposed at an angle at the top of the first section, through the optical column formed within the center section.