Abstract: An addition system of a reducing agent in a semiconductor manufacturing process includes pre-treatment and post-treatment gas concentration detection devices, a process exhaust gas treatment device, a reducing agent supply device, and an addition system control device. The process exhaust gas treatment device purifies exhaust gas of a semiconductor manufacturing process and emits a post-treatment gas. The reducing agent supply device supplies a reducing agent gas into the process exhaust gas treatment device. The post-treatment gas concentration detection device detects a residual concentration of the reducing agent gas in the post-treatment gas. The addition system control device calculates destruction and removal efficiency (DRE) for process gases according to pre-treatment and post-treatment gas concentrations, and, according to the DRE and the residual concentration, sends a signal to the reducing agent supply device to control the amount of the reducing agent gas added.

Abstract: The present invention identifies the PPP2R1B gene, as a human tumor suppressor gene. Sequencing of the PPP2R1B revealed that the gene is located on human chromosome 11q22-24 and that gene were mutated in tumors and tumor cell lines, leading to the classification of this gene as a tumor suppressor. Further analyses have demonstrated the presence of a number of mutations in the gene in lung, colon, breast and cervical cancer cells. Methods for diagnosing and treating cancers related to this tumor suppressor also are disclosed.