Patents by Inventor Jianhui Shan
Jianhui Shan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11067893Abstract: The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C?O)—O—), carbonate (—O—(C?O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.Type: GrantFiled: December 19, 2017Date of Patent: July 20, 2021Assignee: Merck Patent GMbHInventors: Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
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Publication number: 20200019062Abstract: The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C?O)—O—), carbonate (—O—(C?O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.Type: ApplicationFiled: December 19, 2017Publication date: January 16, 2020Inventors: Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
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Patent number: 10155879Abstract: The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A1, A2, and A3 are independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; X1 and X2 are individually selected organic spacers; P1 is an organic polymer repeat unit mType: GrantFiled: December 21, 2015Date of Patent: December 18, 2018Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.Inventors: Guanyang Lin, Hengpeng Wu, JiHoon Kim, Jian Yin, Durairaj Baskaran, Jianhui Shan
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Publication number: 20170174931Abstract: The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A1, A2, and A3 are independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; X1 and X2 are individually selected organic spacers; P1 is an organic polymer repeat unit mType: ApplicationFiled: December 21, 2015Publication date: June 22, 2017Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Guanyang Lin, Hengpeng Wu, JiHoon Kim, Jian Yin, Durairaj Baskaran, Jianhui Shan
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Patent number: 9574104Abstract: The present invention relates to novel copolymers containing cross-linkable and graft-able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly.Type: GrantFiled: October 16, 2015Date of Patent: February 21, 2017Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: JiHoon Kim, Jian Yin, Hengpeng Wu, Jianhui Shan, Guanyang Lin
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Patent number: 9093263Abstract: Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.Type: GrantFiled: September 27, 2013Date of Patent: July 28, 2015Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng Wu, Jian Yin, Guanyang Lin, JiHoon Kim, Jianhui Shan
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Publication number: 20150093912Abstract: Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.Type: ApplicationFiled: September 27, 2013Publication date: April 2, 2015Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng WU, Jian YIN, Guanyang LIN, JiHoon KIM, Jianhui SHAN
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Patent number: 8906590Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): -A-B-C-??(1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.Type: GrantFiled: January 17, 2012Date of Patent: December 9, 2014Assignee: AZ Electronic Materials USA Corp.Inventors: Dalil M Rahman, Douglas McKenzie, Jianhui Shan, JoonYeon Cho, Salem K. Mullen, Clement Anyadiegwu
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Patent number: 8507192Abstract: A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.Type: GrantFiled: February 18, 2010Date of Patent: August 13, 2013Assignee: AZ Electronic Materials USA Corp.Inventors: Huirong Yao, Guanyang Lin, Jianhui Shan, JoonYeon Cho, Salem K. Mullen
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Publication number: 20120251943Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): ?A-B—C???(1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.Type: ApplicationFiled: March 30, 2011Publication date: October 4, 2012Inventors: M. Dalil Rahman, Douglas McKenzie, Jianhui Shan, Joon Yeon Cho, Salem K. Mullen
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Publication number: 20120251956Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): [-A-B-C-]??(1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.Type: ApplicationFiled: January 17, 2012Publication date: October 4, 2012Applicant: AZ ELECTRONIC MATERIALS USA CORP.Inventors: M. Dalil RAHMAN, Douglas MCKENZIE, Jianhui SHAN, JoonYeon CHO, Salem K. MULLEN, Clement ANYADIEGWU
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Patent number: 8221965Abstract: Antireflective coating compositions and related polymers are disclosed.Type: GrantFiled: July 8, 2008Date of Patent: July 17, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Huirong Yao, Zhong Xiang, Jianhui Shan, Salem Mullen, Hengpeng Wu
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Publication number: 20110200938Abstract: A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.Type: ApplicationFiled: February 18, 2010Publication date: August 18, 2011Inventors: Huirong Yao, Guanyang Lin, Jianhui Shan, Joon Yeon Cho, Salem K. Mullen
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Publication number: 20100316949Abstract: The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition.Type: ApplicationFiled: June 10, 2009Publication date: December 16, 2010Inventors: M. Dalil Rahman, Douglas McKenzie, Guanyang Lin, Jianhui Shan, Ruzhi Zhang, Mark Neisser
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Patent number: 7691556Abstract: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.Type: GrantFiled: June 22, 2005Date of Patent: April 6, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Aritaka Hishida, Jianhui Shan, Hong Zhuang
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Publication number: 20100009293Abstract: Antireflective coating compositions and related polymers are disclosed.Type: ApplicationFiled: July 8, 2008Publication date: January 14, 2010Inventors: Huirong Yao, Zhong Xiang, Jianhui Shan, Salem Mullen, Hengpeng Wu
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Patent number: 7638262Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R? and R? are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y? is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.Type: GrantFiled: August 10, 2006Date of Patent: December 29, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Jian Yin, Huirong Yao, PingHung Lu
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Publication number: 20090042133Abstract: An antireflective coating composition which forms films with high n values is described.Type: ApplicationFiled: August 10, 2007Publication date: February 12, 2009Inventors: Zhong Xiang, Jianhui Shan, Jian Yin, David Abdallah
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Publication number: 20090035704Abstract: The present invention relates to an underlayer coating composition capable of being crosslinked comprising a polymer, a compound capable of generating a strong acid, and optionally a crosslinker, where the polymer comprises at least one absorbing chromophore and at least one moiety selected from an epoxy group, an aliphatic hydroxy group and mixtures thereof. The invention further relates to a process of imaging the underlayer coating compositions.Type: ApplicationFiled: August 3, 2007Publication date: February 5, 2009Inventors: Hong Zhuang, Huirong Yao, Hengpeng Wu, Mark Neisser, Weihong Liu, Jianhui Shan, Zhong Xiang
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Publication number: 20080286689Abstract: The present invention relates to antireflective coating compositions.Type: ApplicationFiled: May 14, 2007Publication date: November 20, 2008Inventors: Hong Zhuang, Jianhui Shan, Zhong Xiang, Hengpeng Wu, Jian Yin