Abstract: Disclosed is a testing device and method for a service life of an air-conditioning compressor of a new energy vehicle running with pure gas. The testing device includes an alternative refrigeration system, a measurement and control system, and a testing environment room. A main refrigeration cycle system of the alternative refrigeration system runs with pure gas, gas of a testing compressor is discharged via a discharge throttle valve, and then enters a suction end via a suction throttle valve and an electronic expansion valve, and since there is no phase change, a heat exchange amount is small; adjustable ranges of the discharge throttle valve, the suction throttle valve and the electronic expansion valve are wide; and based on the system structure, a small refrigeration system can be used to test a compressor having high cooling capacity, and the system can quickly achieve a target working condition with a small amount of refrigerant.

Abstract: An electronic assembly includes a circuit board assembly and a liquid cold plate. The circuit board assembly includes a board, a first heat-generating component, and a second heat-generating component, where the first heat-generating component and the second heat-generating component are disposed on the board. The liquid cold plate includes a liquid inlet and a liquid outlet. The liquid cold plate includes a first cooling region and a second cooling region, where the second cooling region is closer to the liquid outlet than the first cooling region. A heat dissipation capability of the first cooling region is stronger than that of the second cooling region. A heat-generating density of the first heat-generating component is greater than that of the second heat-generating component, the first heat-generating component is thermally connected to the first cooling region, and the second heat-generating component is thermally connected to the second cooling region.

Abstract: Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.

Abstract: Extracting shapes from a pixelated SRAF bitmap image of pixels for mask making is disclosed. A method includes receiving the pixelated SRAF bitmap image of pixels, each pixel having a respective brightness value; selecting a ridge point in the pixelated SRAF bitmap image; for each pixel of at least some of the pixels, determining a respective arrival time at the pixel; and determining a mask shape using the arrival times of the at least some of the pixels. The ridge point is one of the pixels and is selected based on the respective brightness value of the one of the pixels. An arrival time is based on a respective brightness value of the pixel and a Mask Rule Check (MRC) rule.

Abstract: A method and a non-transitory computer-readable storage medium for optimizing a dose map for a multi-beam mask writer includes simulating, by a processor, a substrate pattern based on a design pattern and the dose map associated with the design pattern, and updating a value of the dose map based on a comparison between the substrate pattern and the design pattern. An apparatus for optimizing a dose map for a multi-beam mask writer includes a processor and a memory coupled to the processor configured to store instructions to simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern, and update a value of the dose map based on a comparison between the substrate pattern and the design pattern.

Abstract: Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.

Abstract: Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.

Abstract: Extracting shapes from a pixelated SRAF bitmap image of pixels for mask making is disclosed. A method includes receiving the pixelated SRAF bitmap image of pixels, each pixel having a respective brightness value; selecting a ridge point in the pixelated SRAF bitmap image; for each pixel of at least some of the pixels, determining a respective arrival time at the pixel; and determining a mask shape using the arrival times of the at least some of the pixels. The ridge point is one of the pixels and is selected based on the respective brightness value of the one of the pixels. An arrival time is based on a respective brightness value of the pixel and a Mask Rule Check (MRC) rule.

Abstract: Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.

Abstract: A method, an apparatus, and a non-transitory computer readable medium for full chip mask pattern generation include: generating, by a processor, an initial mask image from target polygons, performing, by the processor, a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels, determining performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization, generating a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information, and generating optimized mask patterns based on a localized polygon optimization of the mask.

Abstract: A method, an apparatus, and a non-transitory computer readable medium for full chip mask pattern generation include: generating, by a processor, an initial mask image from target polygons, performing, by the processor, a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels, determining performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization, generating a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information, and generating optimized mask patterns based on a localized polygon optimization of the mask.