Patents by Inventor Jim D. Meador
Jim D. Meador has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9638999Abstract: The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.Type: GrantFiled: February 19, 2009Date of Patent: May 2, 2017Assignee: Brewer Science Inc.Inventors: Jim D. Meador, Douglas J. Guerrero, Ramil-Marcelo L. Mercado
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Patent number: 8383318Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.Type: GrantFiled: February 19, 2010Date of Patent: February 26, 2013Assignee: Brewer Science Inc.Inventors: Jim D. Meador, Joyce A. Lowes, Ramil-Marcelo L. Mercado
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Patent number: 8206893Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).Type: GrantFiled: October 30, 2008Date of Patent: June 26, 2012Assignee: Brewer Science Inc.Inventors: Hao Xu, Ramil-Marcelo L. Mercado, Douglas J. Guerrero, Jim D. Meador
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Publication number: 20100213580Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.Type: ApplicationFiled: February 19, 2010Publication date: August 26, 2010Applicant: BREWER SCIENCE INC.Inventors: Jim D. Meador, Joyce A. Lowes, Ramil-Marcelo L. Mercado
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Publication number: 20090226672Abstract: The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.Type: ApplicationFiled: February 19, 2009Publication date: September 10, 2009Applicant: Brewer Science, Inc.Inventors: Jim D. Meador, Douglas J. Guerrero, Ramil-Marcelo L. Mercado
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Publication number: 20090111057Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).Type: ApplicationFiled: October 30, 2008Publication date: April 30, 2009Inventors: Hao Xu, Ramil-Marcelo L. Mercado, Douglas J. Guerrero, Jim D. Meador
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Patent number: 7507783Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.Type: GrantFiled: February 20, 2004Date of Patent: March 24, 2009Assignee: Brewer Science Inc.Inventors: Jim D. Meador, Mariya Nagatkina, Doug Holmes
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Patent number: 6962769Abstract: Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0.3% by weight of a strong acid. In another embodiment, the weight ratio of strong acid to weak acid in the composition is from about 0:100 to about 25:75. Examples of preferred weak acid compounds include phenolic compounds (e.g., Bisphenol S, Bisphenol A, ?-cyano-4-hydroxycinnamic acid), carboxylic acids (e.g., acetic acid), phosphoric acid, and cyano compounds. The polymer and other ingredients are preferably physically mixed in a solvent system. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature).Type: GrantFiled: September 11, 2003Date of Patent: November 8, 2005Assignee: Brewer Science Inc.Inventors: Xie Shao, Jim D. Meador, Mandar Bhave, Vandana Krishnamurthy, Kelly A. Nowak, Michelle Fowler, Shreeram V. Deshpande
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Publication number: 20040229158Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.Type: ApplicationFiled: February 20, 2004Publication date: November 18, 2004Inventors: Jim D. Meador, Mariya Nagatkina, Doug Holmes, Julie Wilson, Denise Gum
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Publication number: 20040048196Abstract: Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0.3% by weight of a strong acid. In another embodiment, the weight ratio of strong acid to weak acid in the composition is from about 0:100 to about 25:75. Examples of preferred weak acid compounds include phenolic compounds (e.g., Bisphenol S, Bisphenol A, &agr;-cyano-4-hydroxycinnamic acid), carboxylic acids (e.g., acetic acid), phosphoric acid, and cyano compounds. The polymer and other ingredients are preferably physically mixed in a solvent system. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature).Type: ApplicationFiled: September 11, 2003Publication date: March 11, 2004Inventors: Xie Shao, Jim D. Meador, Mandar Bhave, Vandana Krishnamurthy, Kelly A. Nowak, Michelle Fowler, Shreeram V. Deshpande
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Patent number: 6316160Abstract: Anti-reflective compositions are prepared from cellulosic binders with improved etch rates.Type: GrantFiled: August 22, 2000Date of Patent: November 13, 2001Assignee: Brewer Science, Inc.Inventors: Xie Shao, Jim D. Meador, Terry Lowell Brewer
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Patent number: 6156479Abstract: Anti-reflective coating compositions having improved etch rate, inter alia, are prepared from certain acrylic polymers and copolymers, such as, glycidyl methacrylate reacted with non-polycyclic carboxylic acid dyes and non-polycyclic phenolic dyes, all light absorbing at a wavelength of 193 nm.Type: GrantFiled: March 22, 1999Date of Patent: December 5, 2000Assignee: Brewer Science, Inc.Inventors: Jim D. Meador, Kelly A. Nowak, Gu Xu
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Patent number: 5919598Abstract: A method for making multilayer resist structures for microlithographic processing using a thermosetting anti-reflective coating is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.Type: GrantFiled: August 6, 1996Date of Patent: July 6, 1999Assignee: Brewer Science, Inc.Inventors: Tony D. Flaim, Jim D. Meador, Xie Shao, Terry Lowell Brewer
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Patent number: 5892096Abstract: Mid-UV dyes enabling ultra thin antireflection coatings for multi-layer i-line photoetching are produced from bichalcones; bis-a-cyanoacrylates/bis-cyanoacrylamides; and 1.4 divinylbenzenes. The dyes are nonsubliminal and differentially insoluble in standard photoresist solvents.Type: GrantFiled: February 8, 1996Date of Patent: April 6, 1999Assignee: Brewer Science, Inc.Inventors: Jim D. Meador, Xie Shao, Vandana Krishnamurthy, Earnest C. Murphy, Tony D. Flaim, Terry Lowell Brewer
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Patent number: 5693691Abstract: A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.Type: GrantFiled: August 21, 1995Date of Patent: December 2, 1997Assignee: Brewer Science, Inc.Inventors: Tony D. Flaim, Jim D. Meador, Xie Shao, Terry Lowell Brewer
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Patent number: 5688987Abstract: Mid-UV dyes enabling ultra thin antireflection coatings for multi-layer i-line photoetching are produced from bichalcones; bis-a-cyanoacrylates/bis-cyanoacrylamides; and 1.4 divinylbenzenes. The dyes are nonsubliminal and differentially insoluble in standard photoresist solvents.Type: GrantFiled: November 9, 1994Date of Patent: November 18, 1997Assignee: Brewer Science, Inc.Inventors: Jim D. Meador, Xie Shao, Vandana Krishnamurthy, Earnest C. Murphy, Tony D. Flaim, Terry Lowell Brewer
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Patent number: 4272604Abstract: A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact with the surface is a layer comprising an oleophilic ink-receptive organic resin adapted to receive a light-sensitive coating comprising a diazo resin sensitizer. The oleophilic resin layer is permeable to the sensitizer so that it may penetrate substantially through the resin layer to establish sufficient contiguity between the diazo resin and the substrate so that both the light-sensitive coating and the organic resin layer become anchored to the substrate in the areas of exposure when the light-sensitive coating is exposed to light. Methods of preparing the base plate and lithographic plate are also disclosed.Type: GrantFiled: September 13, 1979Date of Patent: June 9, 1981Assignee: Western Litho Plate & Supply Co.Inventors: Jim D. Meador, Edward H. Parker
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Patent number: 4272605Abstract: A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact with the surface is a layer comprising an oleophilic ink-receptive organic resin adapted to receive a light-sensitive coating comprising a diazo resin sensitizer. The oleophilic resin layer is permeable to the sensitizer so that it may penetrate substantially through the resin layer to establish sufficient contiguity between the diazo resin and the substrate so that both the light-sensitive coating and the organic resin layer become anchored to the substrate in the areas of exposure when the light-sensitive coating is exposed to light. Methods of preparing the base plate and lithographic plate are also disclosed.Type: GrantFiled: September 13, 1979Date of Patent: June 9, 1981Assignee: Western Litho Plate & Supply Co.Inventors: Jim D. Meador, Edward H. Parker
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Patent number: 4198470Abstract: A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact with the surface is a layer comprising an oleophilic ink-receptive organic resin adapted to receive a light-sensitive coating comprising a diazo resin sensitizer. The oleophilic resin layer is permeable to the sensitizer so that it may penetrate substantially through the resin layer to establish sufficient contiguity between the diazo resin and the substrate so that both the light-sensitive coating and the organic resin layer become anchored to the substrate in the areas of exposure when the light-sensitive coating is exposed to light. Methods of preparing the base plate and lighographic plate are also disclosed.Type: GrantFiled: March 7, 1978Date of Patent: April 15, 1980Assignee: Western Litho Plate & Supply Co.Inventors: Jim D. Meador, Edward H. Parker