Patents by Inventor Jim Vincent Overkamp
Jim Vincent Overkamp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240012332Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.Type: ApplicationFiled: November 12, 2021Publication date: January 11, 2024Applicant: ASML Netherlands B.V.Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Guilherme BRONDANI TORRI, Sebastianus Adrianus GOORDEN, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Edgar Alberto OSORIO OLIVEROS
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Publication number: 20240004184Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.Type: ApplicationFiled: November 8, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Sebastianus Adrianus GOORDEN, Alexis HUMBLET, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Guilherme BRONDANI TORRI, Edgar Alberto OSORIO OLIVEROS
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Publication number: 20230384694Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.Type: ApplicationFiled: December 2, 2021Publication date: November 30, 2023Applicant: ASML Netherlands B.V.Inventors: Abdullah ALIKHAN, Tammo UITTERDIJK, Johannes Bernardus Charles ENGELEN, Daniel KAMIENIECKI, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Thomas POIESZ, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Johannes Adrianus Cornelis Maria PIJNENBURG, Koos VAN BERKEL, Gregory James DIGUIDO, Anthony C. SOCCI, JR., Iliya SIGAL, Bram Antonius Gerardus LOMANS, Michel Ben Isel HABETS
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Publication number: 20230350301Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.Type: ApplicationFiled: February 17, 2021Publication date: November 2, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Evgenia KURGANOVA, Gosse Charles DE VRIES, Alexey Olegovich POLYAKOV, Jim Vincent OVERKAMP, Teis Johan COENEN, Tamara DRUZHININA, Sonia CASTELLANOS ORTEGA, Olivier Christian Maurice LUGIER
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Publication number: 20230105002Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.Type: ApplicationFiled: February 25, 2021Publication date: April 6, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Johannes Bernardus Charles ENGELEN, Arnoud Willem NOTENBOOM, Jim Vincent OVERKAMP, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Jeroen VAN DUIVENBODE, Erik Johannes NIEUWENHUIS, Koos VAN BERKEL
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Publication number: 20220213593Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.Type: ApplicationFiled: March 20, 2020Publication date: July 7, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Tamara DRUZHININA, Jim Vincent OVERKAMP, Alexey Olegovich POLYAKOV, Teis Johan COENEN, Evgenia KURGANOVA, Ionel Mugurel CIOBICA, Alexander Ludwig KLEIN, Albertus Victor Gerardus MANGNUS, Marijke SCOTUZZI, Bastiaan Maurice VAN DEN BROEK
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Publication number: 20210079519Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.Type: ApplicationFiled: February 21, 2019Publication date: March 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV
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Patent number: 10935895Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: GrantFiled: August 13, 2019Date of Patent: March 2, 2021Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Cornelis Gerardus Van Der Sanden
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Patent number: 10747125Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: November 1, 2018Date of Patent: August 18, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 10747127Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: GrantFiled: August 11, 2017Date of Patent: August 18, 2020Assignee: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
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Publication number: 20190369508Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: ApplicationFiled: August 13, 2019Publication date: December 5, 2019Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik KOEVOETS, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wiilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Corlelis Gerardus Van Der Sanden
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Patent number: 10481502Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: March 12, 2018Date of Patent: November 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 10416574Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: GrantFiled: April 4, 2016Date of Patent: September 17, 2019Assignee: ASML Netherlands B.VInventors: Adrianus Hendrik Koevoets, Sander Catharina Reinier Derks, Franciscus Johannes Joseph Janssen, Jim Vincent Overkamp, Jacobus Cornelis Gerardus Van Der Sanden
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Patent number: 10394140Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.Type: GrantFiled: July 28, 2017Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Hendrikus Herman Marie Cox, Paul Corné Henri De Wit, Arie Jeffrey Den Boef, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Frits Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden
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Publication number: 20190227445Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: ApplicationFiled: August 11, 2017Publication date: July 25, 2019Applicant: ASML Netherlands B.V.Inventors: Frits VAN DER MEULEN, Erik Johan ARLEMARK, Hendrikus Herman Marie COX, Martinus Agnes Willem CUIJPERS, Joost DE HOOGH, Gosse Charles DE VRIES, Paul Comé Henri DE WIT, Sander Catharina Reinier DERKS, Ronald Comelis Gerardus GIJZEN, Dries Vaast Paul HEMSCHOOTE, Christiaan Alexander HOOGENDAM, Adrianus Hendrik KOEVOETS, Raymond Wilhelmus Louis LAFARRE, Alain Louis Claude LEROUX, Patrick Willem Paul LIMPENS, Jim Vincent OVERKAMP, Christiaan Louis VALENTIN, Koos VAN BERKEL, Stan Henricus VAN DER MEULEN, Jacobus Comelis Gerardus VAN DER SANDEN, Harmen Klaas VAN DER SCHOOT, David Ferdinand VLES, Evert Auke Rinze WESTERHUIS
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Publication number: 20190187573Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.Type: ApplicationFiled: July 28, 2017Publication date: June 20, 2019Applicant: ASML Netherlands B.V.Inventors: Hendrikus Herman Marie COX, Paul Corné Henri DE WIT, Arie Jeffrey DEN BOEF, Adrianus Hendrik KOEVOETS, Jim Vincent OVERKAMP, Frits VAN DER MEULEN, Jacobus Cornelis Gerardus VAN DER SANDEN
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Publication number: 20190072863Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: November 1, 2018Publication date: March 7, 2019Applicant: ASML Netherlands B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 10120292Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: October 18, 2016Date of Patent: November 6, 2018Assignee: ASML NETHERLANDS, B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Publication number: 20180267412Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: March 12, 2018Publication date: September 20, 2018Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
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Patent number: RE49142Abstract: A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: October 2, 2019Date of Patent: July 19, 2022Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent