Patents by Inventor Jimmy D. Meador

Jimmy D. Meador has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Patent number: 6894104
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: May 17, 2005
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak
  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Publication number: 20030220431
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Application
    Filed: May 23, 2002
    Publication date: November 27, 2003
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelley A. Nowak
  • Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
    Patent number: RE40920
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: September 22, 2009
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak