Patents by Inventor Jin-Pyoung Kim

Jin-Pyoung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10054513
    Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: August 21, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Joo Kim, Jin-Pyoung Kim, Do-Hyun Seo, Jae-Pil Lee, Hyun-Hoon Lee, Sung-Jo Hwang
  • Publication number: 20170047200
    Abstract: A plasma processing apparatus includes a chamber defining a process space, an upper electrode mounted in the chamber, the upper electrode including a first gas spray port located in a central region of the upper electrode and a second gas spray port located in a peripheral region of the upper electrode, a lower electrode located opposite the upper electrode across the process space, a first gas supply unit configured to supply a first process gas into the process space via the first gas spray port and the second gas spray port, a second gas supply unit configured to supply a second process gas into the process space via the second gas spray port, a sensor configured to sense a state of plasma in an edge portion of the process space, and a controller configured to control the second gas supply unit in response to an output signal of the sensor.
    Type: Application
    Filed: April 13, 2016
    Publication date: February 16, 2017
    Inventors: Hyung-Joo Lee, Kye-hyun Baek, Masayuki Tomoyasu, Jong-seo Hong, Jin-pyoung Kim
  • Publication number: 20160153862
    Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.
    Type: Application
    Filed: July 16, 2015
    Publication date: June 2, 2016
    Inventors: Sung-Joo Kim, Jin-Pyoung Kim, Do-Hyun Seo, Jae-Pil Lee, Hyun-Hoon Lee, Sung-Jo Hwang