Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.

Abstract: Disclosed is a circuit for reducing EMI noise in a driver IC including at least one or more input ports, and at least one or more output ports, the circuit including a power unit connected to any one of the input ports to output a current to the driver IC, and at least one or more resistors arranged in series between the at least one or more output ports of the driver IC and an output terminal connecting an exterior device operated by the driver IC.

Abstract: Disclosed is a circuit for reducing EMI noise in a driver IC including at least one or more input ports, and at least one or more output ports, the circuit including a power unit connected to any one of the input ports to output a current to the driver IC, and at least one or more resistors arranged in series between the at least one or more output ports of the driver IC and an output terminal connecting an exterior device operated by the driver IC.