Abstract: Provided is a method of forming fine patterns capable of minimizing LER and LWR to form high quality nanopatterns, by using a block copolymer having excellent etching selectivity.

Abstract: Provided is a diblock copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:

Abstract: Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:

Abstract: Disclosed is a method of removing metals from hydrocarbon oil, comprising: supplying a feed including hydrocarbon oil; mixing the feed with an aqueous solution including a metal scavenger to prepare a first mixture; separating the first mixture into a first aqueous solution phase and a first hydrocarbon phase and discharging the separated first aqueous solution phase; mixing the separated first hydrocarbon phase with washing water to produce a second mixture; separating the second mixture into a second aqueous solution phase and a second hydrocarbon phase; and recovering the separated second hydrocarbon phase and recirculating the separated second aqueous solution phase.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: Provided are a plasticizer for a resin composition including any one or more selected from a polyvinyl chloride resin, a polyurethane resin, an epoxy resin, a polycarbonate resin or a biodegradable resin, which has excellent mechanical properties such as tensile strength, elongation and hardness, and shape processability, and particularly has excellent flexibility at low temperatures, does not cause bleeding because compatibility with the resins is good, and has excellent transparency, heat resistance, cold resistance and durability, and a resin composition including the same.

Abstract: Provided is a method of identifying authenticity of oil by reacting oil marked by a Oil Marker Composition with a developer to develop a color and then measuring absorbance. According to the present invention, an oil maker capable of quantitatively and qualitatively measuring authenticity of oil due to a rapid reaction rate, excellent reproducibility, and distinct color development that may be observed by the naked eyes, and a method of identifying oil using the same.

Abstract: Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:

Abstract: Provided is a method of preparing poly(alkylene carbonate) using a molecular weight regulator in a process of preparing a copolymer of carbon dioxide/epoxide using a novel complex synthesized from salen-type ligand including a quaternary ammonium salt as a catalyst. According to the present invention, even though the molecular weight regulator is used, an activity of the catalyst may be stably maintained, whereby the low molecular weight of poly(alkylene carbonate) having a desirable level may be effectively provided. In addition, it is expected that since the novel complex as the catalyst of the present invention has a simple structure as compared to the existing copolymerization catalyst, due to the economical preparation cost thereof, the novel complex may be effectively applied to a large-scale commercial process.

Abstract: Provided are an electrolyte for a high-voltage lithium secondary battery and a high-voltage lithium secondary battery containing the same, and more particularly, an electrolyte for a high-voltage lithium secondary battery which may not be oxidized and decomposed at the time of being kept at a high voltage and a high temperature to prevent swelling of a battery through suppression of gas generation, thereby having excellent high-temperature storage characteristics and excellent discharge characteristics at a low temperature while decreasing a thickness increase rate of the battery, and a high-voltage lithium secondary battery containing the same.

Abstract: Provided are an electrolyte for a lithium secondary battery which is not oxidized/decomposed when allowed to stand at a high temperature under high voltage, so as to inhibit generation of gas to prevent expansion of the battery, thereby reducing a battery thickness increase rate, and simultaneously having an excellent storage property at a high temperature, and a lithium secondary battery including the same.

Abstract: Provided are an electrolyte for a lithium secondary battery and a lithium secondary battery containing the same.

Abstract: Provided is a method of identifying authenticity of oil by reacting oil marked by a Oil Marker Composition with a developer to develop a color and then measuring absorbance. According to the present invention, an oil maker capable of quantitatively and qualitatively measuring authenticity of oil due to a rapid reaction rate, excellent reproducibility, and distinct color development that may be observed by the naked eyes, and a method of identifying oil using the same.

Abstract: Provided are a plasticizer for a resin composition including any one or more selected from a polyvinyl chloride resin, a polyurethane resin, an epoxy resin, a polycarbonate resin or a biodegradable resin, which has excellent mechanical properties such as tensile strength, elongation and hardness, and shape processability, and particularly has excellent flexibility at low temperatures, does not cause bleeding because compatibility with the resins is good, and has excellent transparency, heat resistance, cold resistance and durability, and a resin composition including the same.

Abstract: This invention relates to a resin composition using a dicarboxylic acid diester derivative as a plasticizer, and particularly to a resin composition, which is obtained by adding the plasticizer to one or more resins selected from among aliphatic or aromatic polycarbonate resins, polyurethane resins, polyvinyl chloride resins and epoxy resins, and which has a low glass transition temperature (Tg) and can be easily processed and can impart flexibility to products. This plasticizer exhibits high plasticization efficiency, and a resin composition including the plasticizer can manifest a low glass transition temperature and good flexibility at low temperature, thus improving physical properties such as tensile strength, even when only a small amount of the plasticizer is added.