Patents by Inventor Jin-Sung Chun

Jin-Sung Chun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11931000
    Abstract: The present disclosure relates to an openable/closable vertebral endoscopic device. The openable/closable vertebral endoscopic device includes an endoscope body including a working channel for providing an access route of a surgical instrument to a diseased area of a human body, the working channel having an open channel formed by opening a portion of the working channel such that a portion of the surgical instrument inserted into the working channel is exposed to the outside; and a cover member provided on the endoscope body to selectively open or close the open channel of the endoscope body.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: March 19, 2024
    Assignees: THE CATHOLIC UNIVERSITY OF KOREA INDUSTRY-ACADEMIC COOPERATION FOUNDATION, S-MEDION CO., LTD.
    Inventors: Jin Sung Kim, Ji Woon Chun, Hyang Mi Oh
  • Patent number: 11875998
    Abstract: A substrate processing method uses a substrate processing apparatus including a process chamber defining a processing space in the process chamber, a substrate support mounted in the process chamber to place a substrate on the substrate support, a gas sprayer for supplying a process gas onto the substrate support in the processing space, and a remote plasma generator connected to the process chamber. The method includes placing the substrate on the substrate support, continuously supplying a surface processing gas through the remote plasma generator onto the substrate, continuously supplying a purge gas onto the substrate, supplying plasma power to the remote plasma generator to activate the surface processing gas and supply the activated surface processing gas onto the substrate, and cutting off the plasma power supplied to the remote plasma generator and supplying an etching gas onto the substrate.
    Type: Grant
    Filed: December 10, 2020
    Date of Patent: January 16, 2024
    Assignee: WONIK IPS CO., LTD.
    Inventors: Kwang Seon Jin, Jin Sung Chun, Sang Jun Park, Byung Chul Cho, Jun Hyuck Kwon
  • Publication number: 20230335337
    Abstract: A multilayer electronic component includes a body including a dielectric layer and an internal electrode, and an external electrode including an electrode layer disposed on the body and connected to the internal electrode, a first plating layer disposed on the electrode layer, and a conductive resin layer disposed on the first plating layer. The first plating layer has surface roughness higher at an interface with the conductive resin layer than at an interface with the electrode layer, and the conductive resin layer includes a conductive metal and a base resin.
    Type: Application
    Filed: June 20, 2023
    Publication date: October 19, 2023
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Ho In Jun, Kyeong Jun Kim, Jin Sung Chun, Woo Chul Shin, Seul Gi Kim
  • Patent number: 11721480
    Abstract: A multilayer electronic component includes a body including a dielectric layer and an internal electrode, and an external electrode including an electrode layer disposed on the body and connected to the internal electrode, a first plating layer disposed on the electrode layer, and a conductive resin layer disposed on the first plating layer. The first plating layer has surface roughness higher at an interface with the conductive resin layer than at an interface with the electrode layer, and the conductive resin layer includes a conductive metal and a base resin.
    Type: Grant
    Filed: February 18, 2022
    Date of Patent: August 8, 2023
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Ho In Jun, Kyeong Jun Kim, Jin Sung Chun, Woo Chul Shin, Seul Gi Kim
  • Patent number: 11657966
    Abstract: A multilayer electronic component includes: a body including first and second dielectric layers alternately disposed in a first direction; and external electrodes disposed on opposing end surfaces, respectively. A first internal electrode exposed to a first end surface and a first dummy pattern spaced apart from the first internal electrode and exposed to a second end surface are disposed on the first dielectric layer. A second internal electrode exposed to the second end surface and a second dummy pattern spaced apart from the second internal electrode and exposed to the first end surface are disposed on the second dielectric layer. The first and second internal electrodes include first and second main portions, respectively, and the first main portion and the second main portion are arranged in a staggered manner in a width direction.
    Type: Grant
    Filed: June 3, 2021
    Date of Patent: May 23, 2023
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Kyeong Jun Kim, Ho In Jun, Seul Gi Kim, Jin Sung Chun, Jun Ho Yun
  • Publication number: 20230093953
    Abstract: A method of producing a core-shell particle includes introducing a barium titanate-based base powder and an additive to a reactor, and exposing the barium titanate-based base powder and the additive to a thermal plasma torch to obtain core-shell particles including a core portion having barium titanate (BaTiO3) and a shell portion including the additive and formed on a surface of the core portion.
    Type: Application
    Filed: November 22, 2022
    Publication date: March 30, 2023
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jin Sung CHUN, Hae Suk CHUNG, Byung Sung KANG, Yun Jung PARK, Young Hoon SONG
  • Publication number: 20230028568
    Abstract: The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure.
    Type: Application
    Filed: September 30, 2022
    Publication date: January 26, 2023
    Applicant: Intel Corporation
    Inventors: Sameer S. Pradhan, Subhash M. Joshi, Jin-Sung Chun
  • Patent number: 11551871
    Abstract: A dielectric composition includes a ceramic powder, a high polymerization binder, and a low polymerization binder type dispersant having a degree of polymerization between 100 and 1,000.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: January 10, 2023
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jin Sung Chun, Seul Gi Kim, Hyo Kyong Seo, Hae Suk Chung, Byung Sung Kang
  • Patent number: 11538630
    Abstract: A method of producing a core-shell particle includes introducing a barium titanate-based base powder and an additive to a reactor, and exposing the barium titanate-based base powder and the additive to a thermal plasma torch to obtain core-shell particles including a core portion having barium titanate (BaTiO3) and a shell portion including the additive and formed on a surface of the core portion.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: December 27, 2022
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jin Sung Chun, Hae Suk Chung, Byung Sung Kang, Yun Jung Park, Young Hoon Song
  • Patent number: 11450531
    Abstract: The present invention relates to an atomic layer etching method for etching a surface of a substrate by using an atomic layer etching apparatus.
    Type: Grant
    Filed: December 17, 2020
    Date of Patent: September 20, 2022
    Assignee: WONIK IPS CO., LTD.
    Inventors: Jun Hyuck Kwon, Jin Sung Chun, Sang Jun Park, Byung Chul Cho, Kwang Seon Jin
  • Patent number: 11410814
    Abstract: A multilayer electronic component includes a body comprising a capacitance-forming portion including a dielectric layer and a plurality of internal electrodes layered with the dielectric layer interposed therebetween, and upper and lower cover portions disposed on upper and lower surfaces of the capacitance-forming portion, respectively; and external electrodes disposed on the body and electrically connected to at least some of the plurality of internal electrodes, respectively, wherein at least one of the upper cover portion and or the lower cover portion has a step structure, and the step structure has a shorter length and width as compared to the capacitance-forming portion.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: August 9, 2022
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Seul Gi Kim, Jin Sung Chun, Chang Yong Choi
  • Publication number: 20220172892
    Abstract: A multilayer electronic component includes a body including a dielectric layer and an internal electrode, and an external electrode including an electrode layer disposed on the body and connected to the internal electrode, a first plating layer disposed on the electrode layer, and a conductive resin layer disposed on the first plating layer. The first plating layer has surface roughness higher at an interface with the conductive resin layer than at an interface with the electrode layer, and the conductive resin layer includes a conductive metal and a base resin.
    Type: Application
    Filed: February 18, 2022
    Publication date: June 2, 2022
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Ho In Jun, Kyeong Jun Kim, Jin Sung Chun, Woo Chul Shin, Seul Gi Kim
  • Patent number: 11289270
    Abstract: A multilayer electronic component includes a body including a dielectric layer and an internal electrode, and an external electrode including an electrode layer disposed on the body and connected to the internal electrode, a first plating layer disposed on the electrode layer, and a conductive resin layer disposed on the first plating layer. The first plating layer has surface roughness higher at an interface with the conductive resin layer than at an interface with the electrode layer, and the conductive resin layer includes a conductive metal and a base resin.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: March 29, 2022
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Ho In Jun, Kyeong Jun Kim, Jin Sung Chun, Woo Chul Shin, Seul Gi Kim
  • Publication number: 20220093329
    Abstract: A multilayer electronic component includes: a body including first and second dielectric layers alternately disposed in a first direction; and external electrodes disposed on opposing end surfaces, respectively. A first internal electrode exposed to a first end surface and a first dummy pattern spaced apart from the first internal electrode and exposed to a second end surface are disposed on the first dielectric layer. A second internal electrode exposed to the second end surface and a second dummy pattern spaced apart from the second internal electrode and exposed to the first end surface are disposed on the second dielectric layer. The first and second internal electrodes include first and second main portions, respectively, and the first main portion and the second main portion are arranged in a staggered manner in a width direction.
    Type: Application
    Filed: June 3, 2021
    Publication date: March 24, 2022
    Inventors: Kyeong Jun KIM, Ho In JUN, Seul Gi KIM, Jin Sung CHUN, Jun Ho YUN
  • Publication number: 20220076888
    Abstract: A multilayer electronic component includes a body comprising a capacitance-forming portion including a dielectric layer and a plurality of internal electrodes layered with the dielectric layer interposed therebetween, and upper and lower cover portions disposed on upper and lower surfaces of the capacitance-forming portion, respectively; and external electrodes disposed on the body and electrically connected to at least some of the plurality of internal electrodes, respectively, wherein at least one of the upper cover portion and or the lower cover portion has a step structure, and the step structure has a shorter length and width as compared to the capacitance-forming portion.
    Type: Application
    Filed: February 16, 2021
    Publication date: March 10, 2022
    Inventors: Seul Gi KIM, Jin Sung CHUN, Chang Yong CHOI
  • Patent number: 11227724
    Abstract: A method of manufacturing a multilayer ceramic capacitor includes forming a water-repellent coating layer on surfaces of a multilayer ceramic capacitor having an internal electrode, a dielectric layer, and an external electrode; and removing at least a portion of the water-repellent coating layer formed on the surfaces of the external electrode such that another portion of the water-repellent coating layer remains on surfaces of the dielectric layer. The external electrode has first and second surfaces opposing each other in a thickness direction, third and fourth surfaces opposing each other in a width direction, and fifth and sixth surfaces opposing each other in a length direction.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: January 18, 2022
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jin Sung Chun, Hyo Kyong Seo, Hae Suk Chung, Chae Min Park, Byung Sung Kang
  • Patent number: 11114953
    Abstract: A method for manufacturing a charge pump-based artificial lightning generator comprises the steps of: forming a second electrode on a prepared substrate; forming a negatively charged body having a sponge structure under the second electrode; removing spherical polymer particles from the negatively charged body using a toluene solution; allowing metal particles to penetrate into the negatively charged body; forming a positively charged body in a location which is at a predetermined distance below the negatively charged body in order to generate charges; nano-structuring the surface of the positively charged body; coating the nano-structured surface of the positively charged body with second metal particles; forming a ground layer for charge separation while maintaining a constant distance in the downward direction from one side of the positively charged body; and forming a first electrode for charge accumulation in a location which is at a predetermined distance below the positively charged body.
    Type: Grant
    Filed: November 11, 2015
    Date of Patent: September 7, 2021
    Assignees: Samsung Electronics Co., Ltd., UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
    Inventors: Jeong Min Baik, Jin Sung Chun, Byeong Uk Ye
  • Publication number: 20210193472
    Abstract: A substrate processing method uses a substrate processing apparatus including a process chamber defining a processing space in the process chamber, a substrate support mounted in the process chamber to place a substrate on the substrate support, a gas sprayer for supplying a process gas onto the substrate support in the processing space, and a remote plasma generator connected to the process chamber. The method includes placing the substrate on the substrate support, continuously supplying a surface processing gas through the remote plasma generator onto the substrate, continuously supplying a purge gas onto the substrate, supplying plasma power to the remote plasma generator to activate the surface processing gas and supply the activated surface processing gas onto the substrate, and cutting off the plasma power supplied to the remote plasma generator and supplying an etching gas onto the substrate.
    Type: Application
    Filed: December 10, 2020
    Publication date: June 24, 2021
    Applicant: WONIK IPS CO., LTD.
    Inventors: Kwang Seon JIN, Jin Sung CHUN, Sang Jun PARK, Byung Chul CHO, Jun Hyuck KWON
  • Publication number: 20210193473
    Abstract: The present invention relates to an atomic layer etching method for etching a surface of a substrate by using an atomic layer etching apparatus.
    Type: Application
    Filed: December 17, 2020
    Publication date: June 24, 2021
    Applicant: WONIK IPS CO., LTD.
    Inventors: Jun Hyuck KWON, Jin Sung CHUN, Sang Jun PARK, Byung Chul CHO, Kwang Seon JIN
  • Publication number: 20210159013
    Abstract: A method of producing a core-shell particle includes introducing a barium titanate-based base powder and an additive to a reactor, and exposing the barium titanate-based base powder and the additive to a thermal plasma torch to obtain core-shell particles including a core portion having barium titanate (BaTiO3) and a shell portion including the additive and formed on a surface of the core portion.
    Type: Application
    Filed: May 1, 2020
    Publication date: May 27, 2021
    Inventors: Jin Sung CHUN, Hae Suk CHUNG, Byung Sung KANG, Yun Jung PARK, Young Hoon SONG