Patents by Inventor Jin-Woo Ahn
Jin-Woo Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200042731Abstract: Disclosed is a system for controlling access of one or more applications to a storage device, including: a storage device including one or more memories; and a kernel implemented between the applications and the storage device, in which when the kernel receives a first access request to the storage device from a first application, the kernel transmits to the storage device first memory address information to be accessed by the first application and a first access code included in the first access request, and the storage device stores a database for an authorized access code for each memory address information and controls the first application to access a memory corresponding to the first memory address information according to whether the first memory address information and the first access code are present in the database.Type: ApplicationFiled: August 1, 2018Publication date: February 6, 2020Inventors: Youngjae KIM, Junghee LEE, Jin Woo AHN, Donggyu PARK, Sung-Yong PARK
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Patent number: 10213611Abstract: A method of manufacturing a feedthrough having an enhanced hermetic sealing and used for a human implantable medical device such as a deep brain stimulator, a implantable AED, a implantable spinal cord stimulator and so on. Thus, more enhanced reproducibility and productivity in the diffusion welding and the laser hole machining may be guaranteed in the present method of manufacturing the feedthrough, compared to the conventional method using the ceramic metallizing and the brazing.Type: GrantFiled: June 29, 2016Date of Patent: February 26, 2019Assignee: Osong medical innovation foundationInventors: Jin-Won Kim, Jin-Hee Moon, In-Ho Song, Sung-Keun Yoo, Seung-A Lee, Ha-Chul Jung, Dong-Jun Moon, Jin-Woo Ahn, Sang-Hun Lee
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Patent number: 10062574Abstract: A wafer polishing apparatus capable of maintaining a drive ring in a flat state and a wafer polishing method are provided. In the wafer polishing apparatus and method according to an embodiment, when the head assembly moves to the initial descending position by the wafer elevation unit, the shape of the drive ring inside the head assembly may be measured by using the sensor, and thus the polishing process may be performed in the state where the descending position of the head assembly is automatically adjusted by using the head auxiliary elevation unit to maintain the drive ring in the flat state. Therefore, since the wafer polishing process is performed in the state the balance of the wafer mounting part is automatically adjusted by using the drive ring, the polishing quality of the wafer may be uniformly maintained, and also the polishing performance may be improved.Type: GrantFiled: August 25, 2015Date of Patent: August 28, 2018Assignee: SK SILTRON CO., LTD.Inventors: Jin-Woo Ahn, Kee-Yun Han
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Publication number: 20180185654Abstract: A method of manufacturing a feedthrough having an enhanced hermetic sealing and used for a human implantable medical device such as a deep brain stimulator, a implantable AED, a implantable spinal cord stimulator and so on. Thus, more enhanced reproducibility and productivity in the diffusion welding and the laser hole machining may be guaranteed in the present method of manufacturing the feedthrough, compared to the conventional method using the ceramic metallizing and the brazing.Type: ApplicationFiled: June 29, 2016Publication date: July 5, 2018Applicant: OSONG MEDICAL INNOVATION FOUNDATIONInventors: Jin-Won KIM, Jin-Hee MOON, In-Ho SONG, Sung-Keun YOO, Seung-A LEE, Ha-Chul JUNG, Dong-Jun MOON, Jin-Woo AHN, Sang-Hun LEE
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Patent number: 9839110Abstract: A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.Type: GrantFiled: July 28, 2016Date of Patent: December 5, 2017Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Wook-Rae Kim, Won-Don Joo, Byeong-Hwan Jeon, Sung-Hwi Cho, Young-Kyu Park, Jung-Chul Lee, Jin-Woo Ahn
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Patent number: 9759665Abstract: A panel inspecting apparatus and method may accurately inspect image quality of a curved portion of a panel with relatively small inspecting cost and time, and the panel inspecting apparatus may have a relatively simple structure. The panel inspecting apparatus includes a support on which a panel is disposed, a mirror corresponding to a curved area of the panel, a lens configured to receive an image from the panel and an image reflected by the mirror and focus the images, and an image sensor configured to capture the images transferred via the lens.Type: GrantFiled: May 14, 2015Date of Patent: September 12, 2017Assignee: Samsung Electronics Co., Ltd.Inventors: Myoung-ki Ahn, Jin-woo Ahn, Tae-yong Jo, Hyeong-min Ahn, Tae-hyoung Lee
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Patent number: 9752230Abstract: Disclosed is an alpha alumina (?-Al2O3) thin film comprising the lower layer formed on the base material made from cemented carbide; and the ?-Al2O3 thin film layer formed on the lower layer, wherein when the ?-Al2O3 thin film layer is divided, from the total thickness (T) thereof, into a D1 layer which is from an interface layer to 0.15T, a D2 layer which is from 0.15T to 0.4T, and a D3 layer which is from 0.4T to 1T, an S1 (D3 layer grain size/D1 layer grain size) is 2-5.5 and an S2 (D2 layer grain size/D1 layer grain size) is 1.5-4.Type: GrantFiled: November 26, 2014Date of Patent: September 5, 2017Assignee: KORLOY INC.Inventors: Jae Hoon Kang, Dong Youl Lee, Jung Wook Kim, Han Sung Kim, Sung Gu Lee, Jin Woo Ahn, Sun Yong Ahn
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Publication number: 20170111986Abstract: A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.Type: ApplicationFiled: July 28, 2016Publication date: April 20, 2017Inventors: WOOK-RAE KIM, WON-DON JOO, BYEONG-HWAN JEON, SUNG-HWI CHO, YOUNG-KYU PARK, JUNG-CHUL LEE, JIN-WOO AHN
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Patent number: 9534314Abstract: Disclosed is a single-crystal ingot manufacturing apparatus, which includes a crucible in which a melt is accommodated, a heater configured to heat the crucible, a heat shield member configured to shield radiant heat from the heater and the melt, and a neck cover configured to encompass a seed crystal unit above the crucible with being introduced into an opening of the heat shield member, the radiant heat being not shielded in the opening, the neck cover being vertically moved in linkage to vertical movement of the seed crystal unit within a predetermined range.Type: GrantFiled: June 11, 2013Date of Patent: January 3, 2017Assignee: LG SILTRON INCORPORATEDInventors: Il Soo Choi, Jin Woo Ahn, Hak Eui Wang, Yong Jin Kim
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Patent number: 9469917Abstract: Provided is an ingot growing apparatus, which includes a crucible containing a silicon melt, a pulling device pulling a silicon single crystal ingot grown from the silicon melt, and a dopant supply unit disposed adjacent to the pulling device and for supplying a dopant during growing of the ingot. The neck portion may be doped at a concentration higher than that of the ingot through the dopant supply unit. Therefore, dislocation propagation velocity may be decreased and a propagation length may be shortened.Type: GrantFiled: August 10, 2012Date of Patent: October 18, 2016Assignee: LG SILTRON INC.Inventors: Jin-Woo Ahn, Bong-Woo Kim, II-Soo Choi, Do-Yeon Kim
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Publication number: 20160298232Abstract: Disclosed is an alpha alumina (?-Al2O3) thin film comprising the lower layer formed on the base material made from cemented carbide; and the ?-Al2O3 thin film layer formed on the lower layer, wherein when the ?-Al2O3 thin film layer is divided, from the total thickness (T) thereof, into a D1 layer which is from an interface layer to 0.15T, a D2 layer which is from 0.15T to 0.4T, and a D3 layer which is from 0.4T to 1T, an S1 (D3 layer grain size/D1 layer grain size) is 2-5.5 and an S2 (D2 layer grain size/D1 layer grain size) is 1.5-4.Type: ApplicationFiled: November 26, 2014Publication date: October 13, 2016Applicant: KORLOY INC.Inventors: Jae Hoon KANG, Dong Youl LEE, Jung Wook KIM, Han Sung KIM, Sung Gu LEE, Jin Woo AHN, Sun Yong AHN
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Patent number: 9429525Abstract: An optical module for surface inspection includes a first light source unit that illuminates a substrate with first light produced by a first light source and a first beam splitter that changes the path of the first light, a second light source unit that illuminates the substrate with second light polarized in a first direction, a direction of polarization changing unit that illuminates the substrate with the third light polarized in a second direction perpendicular to the first direction, and a detection unit that detects fourth light which is a product of the first light reflecting from the substrate, fifth light which is a product of the second light scattered from the substrate, and sixth light which is a product of the third light scattered from the substrate. The third light is produced by changing the direction of polarization of the second light reflected from the inspected substrate.Type: GrantFiled: July 6, 2015Date of Patent: August 30, 2016Assignee: Samsung Electronics Co., Ltd.Inventors: Myoung-Ki Ahn, Jin-Woo Ahn, Young-Gwon Kim, Tae-Jun Ahn, Tae-Yong Jo, Young Heo
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Publication number: 20160189972Abstract: A wafer polishing apparatus capable of maintaining a drive ring in a flat state and a wafer polishing method are provided. In the wafer polishing apparatus and method according to an embodiment, when the head assembly moves to the initial descending position by the wafer elevation unit, the shape of the drive ring inside the head assembly may be measured by using the sensor, and thus the polishing process may be performed in the state where the descending position of the head assembly is automatically adjusted by using the head auxiliary elevation unit to maintain the drive ring in the flat state. Therefore, since the wafer polishing process is performed in the state the balance of the wafer mounting part is automatically adjusted by using the drive ring, the polishing quality of the wafer may be uniformly maintained, and also the polishing performance may be improved.Type: ApplicationFiled: August 25, 2015Publication date: June 30, 2016Inventors: Jin-Woo AHN, Kee-Yun HAN
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Publication number: 20160097726Abstract: A panel inspecting apparatus and method may accurately inspect image quality of a curved portion of a panel with relatively small inspecting cost and time, and the panel inspecting apparatus may have a relatively simple structure. The panel inspecting apparatus includes a support on which a panel is disposed, a mirror corresponding to a curved area of the panel, a lens configured to receive an image from the panel and an image reflected by the mirror and focus the images, and an image sensor configured to capture the images transferred via the lens.Type: ApplicationFiled: May 14, 2015Publication date: April 7, 2016Inventors: Myoung-ki AHN, Jin-woo AHN, Tae-yong JO, Hyeong-min AHN, Tae-hyoung LEE
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Publication number: 20160047752Abstract: An optical module for surface inspection includes a first light source unit that illuminates a substrate with first light produced by a first light source and a first beam splitter that changes the path of the first light, a second light source unit that illuminates the substrate with second light polarized in a first direction, a direction of polarization changing unit that illuminates the substrate with the third light polarized in a second direction perpendicular to the first direction, and a detection unit that detects fourth light which is a product of the first light reflecting from the substrate, fifth light which is a product of the second light scattered from the substrate, and sixth light which is a product of the third light scattered from the substrate. The third light is produced by changing the direction of polarization of the second light reflected from the inspected substrate.Type: ApplicationFiled: July 6, 2015Publication date: February 18, 2016Inventors: MYOUNG-KI AHN, JIN-WOO AHN, YOUNG-GWON KIM, TAE-JUN AHN, TAE-YONG JO, YOUNG HEO
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Patent number: 9006948Abstract: Disclosed is a hybrid pole bearingless switched reluctance motor (BLSRM). The BLSRM includes a stator provided with windings, a rotor rotating about an axis when current is conducted to the windings. The rotor includes a plurality of rotor poles extending radially outward, and the stator includes a plurality of stator poles extending radially inward. The windings include suspending windings to generate radial force for the rotor and torque windings to generate torque. The suspending windings are mutually separated from the torque windings. Through the use of the hybrid pole BLSRM, a stator pole generating the radial force can be controlled independently from the stator pole generating the torque by separately arranging the stator pole generating the radial force and the stator pole generating torque based on the analysis of radial force and torque characteristics according to the position of the stator poles.Type: GrantFiled: July 14, 2009Date of Patent: April 14, 2015Assignee: Kyungsung University Industry Cooperation FoundationInventors: Jin Woo Ahn, Dong Hee Lee, Huijun Wang
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Patent number: 8821219Abstract: A wafer unloading system and wafer processing equipment (system) including the same are disclosed. The wafer unloading system includes a fluid supply tube for supplying a fluid, a nozzle for injecting the supplied fluid, and an injection hole defined in a plate to allow the injected fluid to reach a space between a polishing pad and a wafer.Type: GrantFiled: January 18, 2011Date of Patent: September 2, 2014Assignee: Siltron Inc.Inventors: Jin-Woo Ahn, Eun-Suck Choi, Bong-Woo Kim, Hwan-Su Yu, Jae-Hwan Yi
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Publication number: 20140205837Abstract: Disclosed is a single-crystal ingot manufacturing apparatus, which includes a crucible in which a melt is accommodated, a heater configured to heat the crucible, a heat shield member configured to shield radiant heat from the heater and the melt, and a neck cover configured to encompass a seed crystal unit above the crucible with being introduced into an opening of the heat shield member, the radiant heat being not shielded in the opening, the neck cover being vertically moved in linkage to vertical movement of the seed crystal unit within a predetermined range.Type: ApplicationFiled: June 11, 2013Publication date: July 24, 2014Inventors: Il Soo CHOI, Jin Woo Ahn, Hak Eui Wang, Yong Jin Kim
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Publication number: 20140190397Abstract: Provided is an ingot growing apparatus, which includes a crucible containing a silicon melt, a pulling device pulling a silicon single crystal ingot grown from the silicon melt, and a dopant supply unit disposed adjacent to the pulling device and for supplying a dopant during growing of the ingot. The neck portion may be doped at a concentration higher than that of the ingot through the dopant supply unit. Therefore, dislocation propagation velocity may be decreased and a propagation length may be shortened.Type: ApplicationFiled: August 10, 2012Publication date: July 10, 2014Inventors: Jin-Woo Ahn, Bong-Woo Kim, Il-Soo Choi, Do-Yeon Kim
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Patent number: 8610389Abstract: Disclosed here is a speed control apparatus for a switched reluctance motor (SRM) including: a current control unit generating command currents for each period; a driving unit generating a pulse width modulation (PWM) signal to allow a voltage to be applied to the SRM; a magnetic flux error calculating unit calculating a magnetic flux error; a rotor position estimating unit calculating an estimation position using the magnetic flux error to output the estimation position to the magnetic flux error calculating unit; and a mode change-over unit allowing a command position corresponding to a command speed to be input to the magnetic flux error calculating unit.Type: GrantFiled: December 29, 2011Date of Patent: December 17, 2013Assignee: Samsung Electro-Mechanics Co., Ltd.Inventors: Dong Hee Lee, Jin Woo Ahn, Geun Min Lim, Byeong Han Kim