Abstract: A quantum rod includes a core of ZnS semiconductor particle having a rod shape; and a transition metal with which the core is doped and which is biased at one side of a length direction of the core.

Abstract: A transparent display device and a method of manufacturing the same are provided. The transparent display device includes: a display panel unit including: a first side configured to display an image, and a second side opposed to the first side, and a variable blocking film at the second side of the display panel unit, the variable blocking film including electrochromic core-shell nanoparticles.

Abstract: Embodiments relate to a quantum rod composition, a quantum rod film, a display device with a quantum rod film, and a method of forming a quantum rod film. The quantum rod film includes a plurality of quantum rods and a polymer with a dipole side chain. Responsive to an external electric field, the major axis of the quantum rods and an axis of the dipole side chain arranges in the same direction. The display device includes a plurality of pixel and common electrodes for generating an electric field, and a backlight unit positioned under a first substrate. Responsive to receiving light from the backlight unit, the quantum rod film emits light polarized in a direction parallel to the major axis of the quantum rods.

Abstract: Disclosed is a method of manufacturing an organic light emitting display device. The method include forming a driving thin film transistor and passivation layer on a substrate, forming a bank layer at a boundary portion between adjacent sub-pixels, on the passivation layer, laminating a first photoresist film on the bank layer, forming a first photoresist pattern by irradiating IR light on the first photoresist film in an area except a first sub-pixel, depositing a first organic emission layer in the first sub-pixel area exposed by the first photoresist pattern, removing the first photoresist pattern, laminating a second photoresist film on the bank layer, forming a second photoresist pattern by irradiating IR light on the second photoresist film in an area except a second sub-pixel, depositing a second organic emission layer in the second sub-pixel area exposed by the second photoresist pattern, and removing the second photoresist pattern.

Abstract: A quantum rod includes a core of ZnS semiconductor particle having a rod shape; and a transition metal with which the core is doped and which is biased at one side of a length direction of the core.

Abstract: A quantum rod luminescent display device includes a first substrate having a plurality of pixel regions; a plurality of first electrodes alternately arranged with a plurality of second electrodes in each of the plurality of pixel regions; a plurality of quantum rod compound layers over the first electrodes and the second electrodes, respectively in each of the plurality of pixel regions, each of the quantum rod compound layers including a quantum rod having a core, a shell surrounding the core, and an electron acceptor; a second substrate facing the first substrate; and a backlight unit at an outer surface of the first substrate. The electron acceptor is attached to or adjacent to the quantum rod.

Abstract: A quantum rod luminescent display device includes a first substrate having a plurality of pixel regions; a plurality of first electrodes alternately arranged with a plurality of second electrodes in each of the plurality of pixel regions; a plurality of quantum rod compound layers over the first electrodes and the second electrodes, respectively in each of the plurality of pixel regions, each of the quantum rod compound layers including a quantum rod having a core, a shell surrounding the core, and an electron acceptor; a second substrate facing the first substrate; and a backlight unit at an outer surface of the first substrate. The electron acceptor is attached to or adjacent to the quantum rod.

Abstract: A quantum rod includes a core of ZnS semiconductor particle having a rod shape; and a transition metal with which the core is doped and which is biased at one side of a length direction of the core.

Abstract: A touch sensing type liquid crystal display device includes an array substrate including a first substrate, a common electrode, a pixel electrode, and a touch sensing unit; a color filter substrate including a second substrate and facing the array substrate; an anti-static layer on an outer side of the second substrate and including a conductive polymer, a UV-setting binder and transparent silica and having a sheet resistance of several tens of Mega ohms per square (?/sq) to several Giga ohms per square (?/sq); and a liquid crystal layer between the first substrate and an inner side of the second substrate.

Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.

Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.

Abstract: A fabricating method and apparatus of a thin film pattern improves the reliability of forming the thin film pattern by a resist printing method. The apparatus includes a print roller device of a roll shape around which a blanket is wound; a spray device located around the print roller device for spraying an etch resist solution to the blanket; and a print plate of an engraved shape where a groove of a desired thin film shape and a projected part except the groove are formed, and the etch resist solution has a surfactant inclusive of an ethylene oxide fluorinated polymer material.

Abstract: A quantum rod luminescent display device includes a first substrate having a plurality of pixel regions; a plurality of first electrodes alternately arranged with a plurality of second electrodes in each of the plurality of pixel regions; a plurality of quantum rod compound layers over the first electrodes and the second electrodes, respectively in each of the plurality of pixel regions, each of the quantum rod compound layers including a quantum rod having a core, a shell surrounding the core, and an electron acceptor; a second substrate facing the first substrate; and a backlight unit at an outer surface of the first substrate. The electron acceptor is attached to or adjacent to the quantum rod.

Abstract: A manufacturing method of an organic light emitting display device is disclosed which includes: forming a thin film transistor on each sub-pixel region which is defined in a substrate; forming a passivation layer on the substrate provided with the thin film transistor; forming a first electrode of an organic light emitting diode in each sub-pixel region of the passivation layer; forming a bank pattern in boundaries of the sub-pixel region of the passivation layer; forming a photoresist pattern, which exposes a first sub-pixel region, on the bank pattern; forming an organic light emission layer on the first electrode within the first sub-pixel region and an organic material layer on the photoresist pattern by depositing an organic material on the entire surface of the substrate provided with the photoresist pattern; and removing the photoresist pattern and the organic material pattern using a detachment film.

Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.

Abstract: A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.

Abstract: A mold structure, a patterning method thereof and a method of fabricating an LCD device using the same are disclosed, which can realize a conformal contact by applying a voltage between a mold structure and a material layer being opposite to each other in an In-Plane Printing process, so as to prevent defective patterns, wherein the mold structure comprises a mold whose surface is provided with patterns; a backplane for supporting the mold; and a conductive film formed between the backplane and the mold.

Abstract: A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.