Patents by Inventor Jing Hui Chen

Jing Hui Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12002807
    Abstract: A semiconductor structure includes a substrate including a first region and a second region; a first device disposed in the first region and a second device disposed in the second region; a first isolation disposed in the first region, wherein the first isolation is between a first source and a first drain, a first spacer overlaps the first isolation, the first isolation is separated from the first spacer by a first gate dielectric.
    Type: Grant
    Filed: June 20, 2022
    Date of Patent: June 4, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jing-Jung Huang, Ching En Chen, Jung-Hui Kao, Kong-Beng Thei
  • Patent number: 11928038
    Abstract: An approach for managing data set access based on data set relevance. The approach monitors data set access activities associated with a user. The approach detects access of a first data set by the user. The approach determines a group of data sets associated with the first data set based on a data set mapping associated with the user. The approach recalls one or more data sets of the group of data sets from a slower storage device to a faster storage device.
    Type: Grant
    Filed: June 21, 2022
    Date of Patent: March 12, 2024
    Assignee: International Business Machines Corporation
    Inventors: Jing Wen Chen, Zhao Yu Wang, Peng Hui Jiang, Jing BJ Ren, Yi Jie Ma, Wen Zhong Liu
  • Patent number: 6121385
    Abstract: Rubber-modified styrenic resin compositions of this invention comprise 90 to 30% by weight of rubber-modified styrenic resins (A) containing rubbery polymers dispersed with an average particle diameter of 0.3 to 2.0 .mu.m in the phase of styrenic polymers (C) and 10 to 70% by weight of styrene-(meth)acrylate ester copolymer resins (B) and, in said compositions, the content of (meth)acrylate ester units is 5 to 50% by weight and the toluene-insolubles (% by weight: X) and the rubber component (% by weight: Y) are present at a ratio (X/Y) in the range from 1.2 to 3.5. The compositions excel in appearance, scratch resistance, impact resistance and rigidity and are easy to fabricate.
    Type: Grant
    Filed: November 17, 1998
    Date of Patent: September 19, 2000
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Yasuji Shichijo, Jing Hui Chen, Keiichi Hayashi, Shigeru Owada, Isao Tanaka, Kiichi Kometani