Abstract: Disclosed is a photocurable resin composition that is alkali-developable, provides a cured product having excellent adhesiveness and scratch resistance, and is useful as a hard-coat material for an image display surface of an image display device. Also disclosed is a novel siloxane compound that is useful as a resin component of the aforementioned photocurable resin composition. Specifically, the invention provides: a photocurable resin composition including (A) a polyol acrylate compound, (B) a compound including, in the molecule thereof, an acrylic or methacrylic group and a carboxyl group, (C) a siloxane compound represented by one of the general formulae (1) to (4), and (D) a photoradical generating agent; and a novel siloxane compound represented by the general formula (4). The specific contents of the general formulae (1) to (4) are as described in the Description.

Abstract: Disclosed is a photocurable resin composition that is alkali-developable, provides a cured product having excellent adhesiveness and scratch resistance, and is useful as a hard-coat material for an image display surface of an image display device. Also disclosed is a novel siloxane compound that is useful as a resin component of the aforementioned photocurable resin composition. Specifically, the invention provides: a photocurable resin composition including (A) a polyol acrylate compound, (B) a compound including, in the molecule thereof, an acrylic or methacrylic group and a carboxyl group, (C) a siloxane compound represented by one of the general formulae (1) to (4), and (D) a photoradical generating agent; and a novel siloxane compound represented by the general formula (4). The specific contents of the general formulae (1) to (4) are as described in the Description.

Abstract: The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.

Abstract: The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.

Abstract: A silicon-containing curable composition, comprising: a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (?) and components (?) described below; a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C); wherein the component (?) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule, wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b?2, and wherein the component (?) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

Abstract: A silicon-containing curable composition, comprising: a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (?) and components (?) described below; a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C); wherein the component (?) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule, wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b?2, and wherein the component (?) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power. A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder. Silica is sequentially held for a predetermined time at each temperature range of 150 to 400° C., 500 to 700° C., and 1,100 to 1,300° C., thereby producing a quartz glass.

Abstract: High purity synthetic quartz glass particles are derived from alkali metal silicate and have a total amount of metal impurities content of at least 1 &mgr;g/g and, in particular, have oxygen-deficient defects. The high-purity synthetic quartz glass particles having high viscosity similar to natural quartz and high-purity similar to known synthetic quartz can be provided at a low cost.

Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power.

Abstract: Water-swellable moisture-curing one-package polyurethane sealant which includes (1) a water-swellable polyurethane prepolymer having 1.5-10% terminal NCO group content obtained by reacting polyisocyanate with polyoxyalkylenepolyol having 50-90% of oxyethylene units based on polyalkylene chain molecular weight (2) non water-swellable polyurethane prepolymer having terminal NCO groups obtained by reacting polyisocyanate with polyoxyalkylenepolyol having 3-4 carbon atom oxyalkylene units, and (3) a filler. The sealant exhibits has been improved storage stability.

Abstract: Nuclear chlorination of aromatic compounds having an electron donating group is effected by contacting said aromatic compound with copper (II) chloride in an aqeuous hydrochloric acid solution and adding chlorine to the reaction system to maintain the mole ratio of (a) copper (I) chloride to (b) the sum of copper (I) chloride plus copper (II) chloride at more than 0.005/l but less than about 0.3/l.