Patents by Inventor Jiro Ota

Jiro Ota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140372254
    Abstract: An information outputting apparatus is provided which can provide various information to a user and acquire various information indicating a moving state and the like of the user without separately acquiring user identification information again. An electronic shelf label T comprises a display 5 that displays a price and the like, a transmission/reception unit 1 that receives a customer ID for identifying a customer from a terminal apparatus P carried by the customer by wireless communication, a recording unit 2 that associates time data indicating time when the customer ID is received with the received customer ID and records the time data and the customer ID as customer/time data 21, and a transmission/reception unit 4 that associates the recorded customer/time data 21 with a sale item ID 20 and transmits the customer/time data 21 and the sale item ID 20 to the server apparatus SV.
    Type: Application
    Filed: May 29, 2014
    Publication date: December 18, 2014
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kuniaki ARAGANE, Jiro OTA, Kei SEKIGUCHI
  • Patent number: 7884698
    Abstract: An electronic component is provided in which: impact-absorbing layers are provided so as to cover at least the corner portions of both end portions of a base which is made of an insulating mixture of ceramic and glass; a conductive film is formed so as to cover the surface of these impact-absorbing layers and the surface of the base; the portions of this conductive film which cover the surfaces of the impact-absorbing layers are formed into electrodes; and a resistance-adjusting groove is provided in an other portion of the conductive film than the portions serving as the electrodes.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: February 8, 2011
    Assignee: Panasonic Corporation
    Inventors: Hideki Tanaka, Tomoyuki Washizaki, Kiyoshi Ikeuchi, Toshiyuki Iwao, Yasuki Nagatomo, Kesato Iiboshi, Jiro Ota, Yasuhiro Izumi
  • Publication number: 20060255897
    Abstract: An electronic component is provided in which: impact-absorbing layers are provided so as to cover at least the corner portions of both end portions of a base which is made of an insulating mixture of ceramic and glass; a conductive film is formed so as to cover the surface of these impact-absorbing layers and the surface of the base; the portions of this conductive film which cover the surfaces of the impact-absorbing layers are formed into electrodes; and a resistance-adjusting groove is provided in an other portion of the conductive film than the portions serving as the electrodes.
    Type: Application
    Filed: April 30, 2004
    Publication date: November 16, 2006
    Inventors: Hideki Tanaka, Tomoyuki Washizaki, Kiyoshi Ikeuchi, Toshiyuki Iwao, Yasuki Nagatomo, Kesato Iiboshi, Jiro Ota, Yasuhiro Izumi
  • Patent number: 6872112
    Abstract: To attain an increase in production speed and suitable for mass production in a substrate processing operation such as film formation requiring a hermetic atmosphere. A substrate processing method for performing a predetermined processing on a substrate is provided, which includes the steps of: arranging a surface of the substrate to be processed in a hermetic atmosphere; evacuating said hermetic atmosphere; and performing a predetermined processing on the substrate, in which the processing step is conducted after moving the evacuated hermetic atmosphere from the station for evacuation to a ifferent station.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: March 29, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Jiro Ota
  • Publication number: 20020193034
    Abstract: To attain an increase in production speed and suitable for mass production in a substrate processing operation such as film formation requiring a hermetic atmosphere. A substrate processing method for performing a predetermined processing on a substrate is provided, which includes the steps of: arranging a surface of the substrate to be processed in a hermetic atmosphere; evacuating said hermetic atmosphere; and performing a predetermined processing on the substrate, in which the processing step is conducted after moving the evacuated hermetic atmosphere from the station for evacuation to a ifferent station.
    Type: Application
    Filed: May 23, 2002
    Publication date: December 19, 2002
    Inventor: Jiro Ota