Abstract: The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Abstract: The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m×n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

Abstract: The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (91) with a plurality of individually shaped, controllable particle beamlets (118) which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Abstract: The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m×n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.