Abstract: A light source module for use in an analytical instrument for analyzing at least one sample is disclosed. The light source module includes at least one light-emitting diode and at least one light guiding rod adapted to guide and shape light emitted by the light-emitting diode. The light source module further includes at least one memory device. The memory device has stored therein at least one driving parameter set, for driving the light-emitting diode in such a way that desired emission properties of light provided by the light source module are generated.

Abstract: In one aspect of the present disclosure an optical measurement device includes a sample holder defining a sample plane, wherein the sample holder is configured to arrange a sample carrier including an array of measurement positions in the sample plane, an illumination unit configured to illuminate the sample plane, a detector and an optical imaging system configured to image the sample plane including the array of measurement positions onto the detector, the optical imaging system including two or more curved reflective elements adapted to image the sample plane onto the detector with a magnification of between 2:1 and 1:2 and the detector being configured to take an image of all measurement positions of the array of measurement positions at a time.

Abstract: The present disclosure relates to a method for characterizing a light source. The method includes providing a light source to be characterized, collecting light emitted from the light source by using imaging optics, the imaging optics generating a pupil of the collected light emitted from the light source, generating an image of a pupil of light emitted only from a first surface area of the light source at a detector using the imaging optics, laterally shifting the light source and the imaging optics relative to each other and after the lateral shift, generating an image of a pupil of light emitted only from a second surface area of the light source at the detector using the imaging optics. The imaging optics includes a field stop between the light source and the detector to select a portion of the light source's surface from which light is imaged at a time.

Abstract: In one aspect of the present disclosure an optical measurement device includes a sample holder defining a sample plane, wherein the sample holder is configured to arrange a sample carrier including an array of measurement positions in the sample plane, an illumination unit configured to illuminate the sample plane, a detector and an optical imaging system configured to image the sample plane including the array of measurement positions onto the detector, the optical imaging system including two or more curved reflective elements adapted to image the sample plane onto the detector with a magnification of between 2:1 and 1:2 and the detector being configured to take an image of all measurement positions of the array of measurement positions at a time.

Abstract: An instrument is disclosed with a lens system including an objective lens system. The objective lens system is disposed between a light source and the plurality of reaction regions. The objective lens system includes a field lens array, and a pupil plane, wherein the pupil plane and the light source are located on opposite sides of the field lens array.

Abstract: An apparatus for photometric measurement of biological liquids and a method of simultaneously measuring the presence or quantity of an analyte in a sample region are disclosed. The apparatus includes a plurality of spaced apart sample regions; a light source adapted to emit light including at least one frequency; a lens system including a light coupling system, wherein the light coupling system is disposed between the light source and the plurality of sample regions. A method is also disclosed including illuminating the sample region with a light beam emitted from a light source, wherein said light beam passes a light coupling system, the light coupling system including a telecentric element and a plurality of light mixing rods, wherein the light coupling system is disposed between the light source and the sample region such that the light beam is directed into the sample region.

Abstract: An apparatus for photometric measurement of biological liquids and a method of simultaneously measuring the presence or quantity of an analyte in a sample region are disclosed. The apparatus includes a plurality of spaced apart sample regions; a light source adapted to emit light including at least one frequency; a lens system including a light coupling system, wherein the light coupling system is disposed between the light source and the plurality of sample regions. A method is also disclosed including illuminating the sample region with a light beam emitted from a light source, wherein said light beam passes a light coupling system, the light coupling system including a telecentric element and a plurality of light mixing rods, wherein the light coupling system is disposed between the light source and the sample region such that the light beam is directed into the sample region.

Abstract: A light source module for use in an analytical instrument for analyzing at least one sample is disclosed. The light source module includes at least one light-emitting diode and at least one light guiding rod adapted to guide and shape light emitted by the light-emitting diode. The light source module further includes at least one memory device. The memory device has stored therein at least one driving parameter set, for driving the light-emitting diode in such a way that desired emission properties of light provided by the light source module are generated.

Abstract: An instrument is disclosed with a lens system including an objective lens system. The objective lens system is disposed between a light source and the plurality of reaction regions. The objective lens system includes a field lens array, and a pupil plane, wherein the pupil plane and the light source are located on opposite sides of the field lens array.

Abstract: The present invention relates to an illumination system for microlithography, especially for wavelengths ?193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.

Abstract: The invention concerns an optical instrument for imaging fluorescence signals from an arrangement of a plurality of individual detection sites, for example the wells of a microtitre plate. In order to improve the light yield of the fluorescence excitation with excitation light as well as the light yield of the detection of the fluorescence signals, an objective array is provided which is arranged in the beam path between the field lens and the detection sites and comprises a field lens array with field lens array elements and a pupil lens array with pupil lens array elements. In order to improve the channel separation and suppress interfering light the objective array can comprise a diaphragm array with in each case two diaphragm openings per detection site.

Abstract: The invention concerns an optical instrument for imaging fluorescence signals from an arrangement of a plurality of individual detection sites, for example the wells of a microtitre plate. In order to improve the light yield of the fluorescence excitation with excitation light as well as the light yield of the detection of the fluorescence signals, an objective array is provided which is arranged in the beam path between the field lens and the detection sites and comprises a field lens array with field lens array elements and a pupil lens array with pupil lens array elements. In order to improve the channel separation and suppress interfering light the objective array can comprise a diaphragm array with in each case two diaphragm openings per detection site.

Abstract: An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.

Abstract: There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ?193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Abstract: There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

Abstract: There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.

Abstract: There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.

Abstract: There is provided, a system that includes (a) a source of light having a wavelength of less than or equal to about 193 nm, (b) an optical element having a region for directing the light, (c) an arrangement for cleaning the region, and (d) a chamber to accommodate the region during the cleaning.