Patents by Inventor Joan Campderros

Joan Campderros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190126551
    Abstract: Powder distribution in additive manufacturing may include systems or methods to distribute powder from an intermediate buffer or reservoir while scanning over a stage with the buffer or reservoir.
    Type: Application
    Filed: August 31, 2016
    Publication date: May 2, 2019
    Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
    Inventors: Joan CAMPDERROS CANAS, Marta TUA SARDA, Gonzalo GASTON LLADO, Josep TENAS GARCIA, Sergio VILLAR GARCIA
  • Publication number: 20190118479
    Abstract: In an example, a method includes controlling a drive mechanism (110) of an additive manufacturing apparatus (100) to move a build platform (104) of the apparatus relative a static member (102); monitoring the movement of the build platform (104) using an optical sensor (302) that senses relative displacement between the build platform (104) and the static member (102); and generating calibration data based on the movement of the build platform (104) for calibrating a drive controller (120) of the drive mechanism (110) to compensate for run-out effects in the movement of the build platform.
    Type: Application
    Filed: January 19, 2017
    Publication date: April 25, 2019
    Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
    Inventors: Francesc SALA ROURA, Gonzalo GASTON LLADO, Joan CAMPDERROS CANAS, Pau SERRA BERGERON
  • Patent number: 8136910
    Abstract: The invention relates to a calibration method for a printer having a mechanism for advancing a medium in a direction of media advance comprising the following steps: (a) providing a printhead, the printhead having a swath height in the direction of media advance; (b) providing an estimate of either the swath height or the characteristic of the mechanism; (c) printing a base pattern on a medium using the printhead; (d) printing an overlay pattern on the medium using the printhead to form an interference pattern; (e) advance the medium of a predetermined distance using the mechanism at a time between the printing of the base pattern and the printing of the overlay pattern; (f) analyze an optical evaluation of the interference pattern; (g) evaluate as either: (i) the swath height if the characteristic of the mechanism is known or estimated; or (ii) the characteristic of the mechanism if the swath height is known or estimated.
    Type: Grant
    Filed: June 7, 2006
    Date of Patent: March 20, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Pasqual Batalla, Jordi Sender, Marc Bautista, Toni Gracia, Angel Alvarez, Jean Frederic Plante, Alex Andrea, Pascal Ruiz, Joan Campderros, Angel Martinez Barambio, Alejandro Campillo, Marcos Casaldaliga
  • Patent number: 7380898
    Abstract: The invention relates to a calibration method for a printer having a mechanism for advancing a medium in a direction of media advance comprising the following steps: a—providing a printhead, the printhead having a swath height in the direction of media advance; b—providing an estimate of either the swath height or the characteristic of the mechanism; c—printing a base pattern on a medium using the printhead; d—printing an overlay pattern on the medium using the printhead to form an interference pattern; e—advance the medium of a predetermined distance using the mechanism at a time between the printing of the base pattern and the printing of the overlay pattern; f—analyze an optical evaluation of the interference pattern; g—evaluate as either: i—the swath height if the characteristic of the mechanism is known or estimated; or ii—the characteristic of the mechanism if the swath height is known or estimated.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: June 3, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jean Frederic Plante, Alex Andrea, Pascal Ruiz, Joan Campderros, Angel Martinez Barambio, Alejandro Campillo, Marcos Casaldaliga
  • Publication number: 20070076038
    Abstract: The invention relates to a calibration method for a printer having a mechanism for advancing a medium in a direction of media advance comprising the following steps: a- providing a printhead, the printhead having a swath height in the direction of media advance; b- providing an estimate of either the swath height or the characteristic of the mechanism; c- printing a base pattern on a medium using the printhead; d- printing an overlay pattern on the medium using the printhead to form an interference pattern; e- advance the medium of a predetermined distance using the mechanism at a time between the printing of the base pattern and the printing of the overlay pattern; f- analyze an optical evaluation of the interference pattern; g- evaluate as either: i- the swath height if the characteristic of the mechanism is known or estimated; or ii- the characteristic of the mechanism if the swath height is known or estimated.
    Type: Application
    Filed: October 3, 2005
    Publication date: April 5, 2007
    Inventors: Jean Plante, Alex Andrea, Pascal Ruiz, Joan Campderros, Angel Barambio, Alejandro Campillo, Marcos Casaldaliga
  • Publication number: 20070076039
    Abstract: The invention relates to a calibration method for a printer having a mechanism for advancing a medium in a direction of media advance comprising the following steps: (a) providing a printhead, the printhead having a swath height in the direction of media advance; (b) providing an estimate of either the swath height or the characteristic of the mechanism; (c) printing a base pattern on a medium using the printhead; (d) printing an overlay pattern on the medium using the printhead to form an interference pattern; (e) advance the medium of a predetermined distance using the mechanism at a time between the printing of the base pattern and the printing of the overlay pattern; (f) analyze an optical evaluation of the interference pattern; (g) evaluate as either: (i) the swath height if the characteristic of the mechanism is known or estimated; or (ii) the characteristic of the mechanism if the swath height is known or estimated.
    Type: Application
    Filed: June 7, 2006
    Publication date: April 5, 2007
    Inventors: Pasqual Batalla, Jordi Sender, Marc Bautista, Toni Gracia, Angel Alvarez, Jean Plante, Alex Andrea, Pascal Ruiz, Joan Campderros, Angel Barambio, Alejandro Campillo, Marcos Casaldaliga