Patents by Inventor Jochen Klais

Jochen Klais has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device
    Patent number: 7550396
    Abstract: By performing a plasma treatment for efficiently sealing the surface of a stressed dielectric layer containing silicon nitride, an enhanced performance during the patterning of contact openings may be achieved, since nitrogen-induced resist poisoning may be significantly reduced during the selective patterning of stressed layers of different types of intrinsic stress.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: June 23, 2009
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Kai Frohberg, Volker Grimm, Sven Mueller, Matthias Lehr, Ralf Richter, Jochen Klais, Martin Mazur, Heike Salz, Joerg Hohage, Matthias Schaller
  • METHOD FOR REDUCING RESIST POISONING DURING PATTERNING OF SILICON NITRIDE LAYERS IN A SEMICONDUCTOR DEVICE
    Publication number: 20080081480
    Abstract: By performing a plasma treatment for efficiently sealing the surface of a stressed dielectric layer containing silicon nitride, an enhanced performance during the patterning of contact openings may be achieved, since nitrogen-induced resist poisoning may be significantly reduced during the selective patterning of stressed layers of different types of intrinsic stress.
    Type: Application
    Filed: May 1, 2007
    Publication date: April 3, 2008
    Inventors: Kai Frohberg, Volker Grimm, Sven Mueller, Matthias Lehr, Ralf Richter, Jochen Klais, Martin Mazur, Heike Salz, Joerg Hohage, Matthias Schaller