Patents by Inventor Joel K. Yang

Joel K. Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanotemplate arbitrary-imprint lithography
    Patent number: 8603381
    Abstract: In a method for imprinting a layer of material, a nanotemplate is impressed into a material layer, and the nanotemplate is maintained impressed in the material layer until a geometric trench corresponding to geometry of the nanotemplate is formed in the layer, and the nanotemplate is then removed from the material layer. A nanotemplate geometric trench is repeatedly formed in the material layer by nanotemplate impressions in the layer, until a final desired imprint pattern is produced in the layer. Each nanotemplate geometric trench is characterized by an extent that is a fraction of an extent of the final desired imprint pattern. The material layer is maintained in a condition for accepting nanotemplate impressions continuously throughout the nanotemplate impression repetition.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: December 10, 2013
    Assignee: Massachusetts Insitute of Technology
    Inventors: Karl K. Berggren, Stefan Harrer, Giovanni A. Salvatore, Joel K. Yang
  • Nanotemplate arbitrary-imprint lithography
    Publication number: 20100078854
    Abstract: In a method for imprinting a layer of material, a nanotemplate is impressed into a material layer, and the nanotemplate is maintained impressed in the material layer until a geometric trench corresponding to geometry of the nanotemplate is formed in the layer, and the nanotemplate is then removed from the material layer. A nanotemplate geometric trench is repeatedly formed in the material layer by nanotemplate impressions in the layer, until a final desired imprint pattern is produced in the layer. Each nanotemplate geometric trench is characterized by an extent that is a fraction of an extent of the final desired imprint pattern. The material layer is maintained in a condition for accepting nanotemplate impressions continuously throughout the nanotemplate impression repetition.
    Type: Application
    Filed: October 3, 2006
    Publication date: April 1, 2010
    Applicant: Massachusetts Institute of Technology
    Inventors: Karl K. Berggren, Stefan Harrer, Giovanni A. Salvatore, Joel K. Yang