Patents by Inventor Joel Seligson
Joel Seligson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10274425Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.Type: GrantFiled: May 8, 2017Date of Patent: April 30, 2019Assignee: KLA-Tencor CorporationInventors: Joel Seligson, Noam Sapiens, Daniel Kandel
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Patent number: 10261014Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.Type: GrantFiled: December 26, 2014Date of Patent: April 16, 2019Assignee: KLA-Tencor CorporationInventors: Noam Sapiens, Joel Seligson, Vladimir Levinski, Daniel Kandel, Yoel Feler, Barak Bringoltz, Amnon Manassen, Eliav Benisty
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Patent number: 10139528Abstract: Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may comprise common-path optical elements configured to handle both imaging and scatterometry signals received through the objective lens. Using a single objective lens simplifies the design of the optical system while maintaining, simultaneously, the performance requirements for imaging as well as for scatterometry.Type: GrantFiled: January 17, 2017Date of Patent: November 27, 2018Assignee: KLA-Tencor CorporationInventors: Joel Seligson, Vladimir Levinski, Yuri Paskover, Amnon Manassen, Daniel Kandel, Andrew V. Hill
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Publication number: 20170307523Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.Type: ApplicationFiled: May 8, 2017Publication date: October 26, 2017Inventors: Joel Seligson, Noam Sapiens, Daniel Kandel
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Patent number: 9645079Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.Type: GrantFiled: July 8, 2015Date of Patent: May 9, 2017Assignee: KLA-Tencor CorporationInventors: Joel Seligson, Noam Sapiens, Daniel Kandel
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Patent number: 9442369Abstract: An electro-deposition apparatus deposits a first pattern of a lithographic mask. The electro-deposition apparatus then deposits a second pattern of the lithographic mask, at least partially offset from the first pattern. The resulting lithographic mask includes a first pattern having a minimum feature resolution size and maximum pitch, and a second pattern having the same minimum feature resolution size and maximum pitch. The first pattern and second pattern are at least partially offset such that a fractional portion of the second pattern is realized and light transmission is more precisely controlled.Type: GrantFiled: July 24, 2013Date of Patent: September 13, 2016Assignee: KLA-Tencor CorporationInventors: Dmitry Shur, Joel Seligson
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Publication number: 20160003735Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.Type: ApplicationFiled: July 8, 2015Publication date: January 7, 2016Inventors: Joel Seligson, Noam Sapiens, Daniel Kandel
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Patent number: 9104120Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.Type: GrantFiled: February 8, 2012Date of Patent: August 11, 2015Assignee: KLA-Tencor CorporationInventors: Joel Seligson, Noam Sapiens, Daniel Kandel
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Publication number: 20150198524Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.Type: ApplicationFiled: December 26, 2014Publication date: July 16, 2015Inventors: Noam Sapiens, Joel Seligson, Vladimir Levinski, Daniel Kandel, Yoel Feler, Barak Bringoltz, Amnon Manassen, Eliav Benisty
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Patent number: 9080971Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: October 16, 2014Date of Patent: July 14, 2015Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20150036142Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: ApplicationFiled: October 16, 2014Publication date: February 5, 2015Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Patent number: 8908175Abstract: A scatterometry tool including an illumination source for directing a light beam into a first optical beam shaping and positioning element at an illumination pupil plane of the tool where the light beam is modulated and directed to an objective lens system having a high numerical aperture. The objective receiving the modulated light beam and directing it onto a target to generate a scattering signal. The objective lens collects the scattering signal and directs it to a second optical beam shaping and positioning element at a collection pupil plane where the signal is modulated and then directed to detectors for receiving and processing the signal to determine surface characteristics of the target.Type: GrantFiled: September 13, 2006Date of Patent: December 9, 2014Assignee: KLA-Tencor CorporationInventors: Daniel Kandel, Michael Adel, Joel Seligson, Boris Golovanevsky
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Patent number: 8896832Abstract: Systems and methods for discrete polarization scatterometry are provided.Type: GrantFiled: May 16, 2011Date of Patent: November 25, 2014Assignee: KLA-Tencor Corp.Inventors: Andrew V. Hill, Amnon Manassen, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alexander Svizher, David Y. Wang, Lawrence D. Rotter, Johannes D. de Veer
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Patent number: 8873054Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: April 17, 2013Date of Patent: October 28, 2014Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Patent number: 8681413Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.Type: GrantFiled: June 27, 2011Date of Patent: March 25, 2014Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Joel Seligson, Noam Sapiens
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Patent number: 8582114Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.Type: GrantFiled: August 15, 2011Date of Patent: November 12, 2013Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Vladimir Levinski, Noam Sapiens, Joel Seligson, Andy Hill, Ohad Bachar, Daria Negri, Ofer Zaharan
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Publication number: 20130229661Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: ApplicationFiled: April 17, 2013Publication date: September 5, 2013Applicant: KLA-Tencor CorporationInventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Patent number: 8441639Abstract: Various metrology systems and methods are provided.Type: GrantFiled: August 31, 2010Date of Patent: May 14, 2013Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20130044331Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.Type: ApplicationFiled: August 15, 2011Publication date: February 21, 2013Applicant: KLA-TENCOR CORPORATIONInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Vladimir Levinski, Noam Sapiens, Joel Seligson, Andy Hill, Ohad Bachar, Daria Negri, Ofer Zaharan
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Publication number: 20120327503Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.Type: ApplicationFiled: June 27, 2011Publication date: December 27, 2012Applicant: KLA-Tencor CorporationInventors: Amnon Manassen, Joel Seligson, Noam Sapiens